透明疏水薄膜的制备和性能研究

发布时间：2018-01-22 11:41

本文关键词： 等离子体增强化学气相沉积氟碳薄膜疏水性透过率　出处：《天津科技大学》2015年硕士论文　论文类型：学位论文

【摘要】：本论文以十四氟己烷、全氟萘烷、1H,1H,2H-全氟-1-癸烯和全氟联苯为聚合单体,采用等离子体增强化学气相沉积法(PECVD)在基片上来沉积氟碳薄膜。通过接触角测量仪来测定薄膜的静态水接触角(WCA)来分析其疏水性能,使用傅立叶红外光谱(FTIR)和X射线光电子能谱(XPS)来分析其表面化学组成,通过原子力显微镜(AFM)来观察所沉积薄膜的表面形貌,关于薄膜的透明性我们选用紫外可见分光光度计(UV-Vis)通过测量200-800 nm范围内对光的透过率来研究,表面等离子体共振(SPR)技术是用来测定纳米级的薄膜厚度一种有效的手段。实验结果表明1H,1H,2H-全氟-1-癸烯(PFDE)是最佳的所需单体,一方面由于作为较高沸点的液体,能够在室温的条件下提供一个稳定的单体流量速度。另一方面由于该单体含有较多的CF2基团,可以为疏水性薄膜提高大量的疏水官能团。在不同的放电模式下沉积薄膜的水接触角不同,连续波模式下在107°左右,并且在45天内保持稳定。脉冲条件下则可以达到120°左右,在第二天就下降到112°,但是随着时间的延长而保持稳定。通过红外谱图和XPS谱图分析脉冲条件下的CF2含量要高于连续波模式下的,沉积条件为脉冲放电模式,放电功率为60 W,Ton/Toff=2 ms/75 ms的氟碳薄膜中CF2含量为54.5%,连续波放电模式下,放电功率60W的氟碳薄膜中CF2含量是37.8%。紫外可见实验结果表明当沉积薄膜厚度为30 nm时,在200-800 nm范围内透过率可以达到90%及以上,随着薄膜厚度的增大光的透过率下降。在脉冲放电条件下(Ton/Toff=2 ms/18 ms),放电功率60 W,通过一系列不同沉积时间得到不同厚度的薄膜,模拟计算该条件下的沉积速率为1.0 nm/s。
[Abstract]:In this paper, 14 fluorohexane, 1H ~ (1) H ~ (-1) H ~ (1) H ~ (1) H ~ (-1) H ~ (2 +) -perfluoro-1-decene and perfluorinated biphenyls were used as polymeric monomers. Fluorocarbon films were deposited on substrates by plasma enhanced chemical vapor deposition (PECVD). The hydrophobicity of the films was analyzed by measuring the static water contact angle (WCA) of the films by contact angle measurement. The surface chemical composition was analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The surface morphology of the films was observed by atomic force microscopy (AFM). The transparency of the films is studied by measuring the transmittance of the films in the range of 200-800 nm. Surface plasmon resonance (SPR) technique is an effective method for measuring the thickness of nanocrystalline films. 2H-perfluoro-1-decene (PFDE) is the most suitable monomer, due on the one hand to the liquid with higher boiling point. It can provide a stable monomer flow rate at room temperature. On the other hand, the monomer contains more CF2 groups. It can increase a large number of hydrophobic functional groups for hydrophobic films. The water contact angles of the deposited films are different in different discharge modes and 107 掳in continuous wave mode. And it remained stable in 45 days, and reached 120 掳under pulse condition, and then decreased to 112 掳on the second day. However, with the prolongation of time, the content of CF2 in pulse mode is higher than that in continuous wave mode, and the deposition condition is pulse discharge mode. The content of CF2 in fluorocarbon films with 60 WN / Toff2 ms/75 Ms discharge power is 54.5 in continuous wave discharge mode. The CF2 content of the fluorocarbon films with discharge power of 60W is 37.80.The results of UV-Vis experiments show that the thickness of the deposited films is 30 nm. The transmittance can reach 90% and above in the range of 200-800 nm. The light transmittance decreases with the increase of film thickness, and the discharge power is 60W under the condition of pulse discharge. Thin films with different thickness were obtained by a series of different deposition times, and the deposition rate was calculated to be 1.0 nm / s under this condition.
【学位授予单位】：天津科技大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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