退火温度对分步溅射制备铜锌锡硫薄膜性能的影响

发布时间：2018-02-04 17:25

  本文关键词： 激光技术 铜锌锡硫 二元硫化物靶 磁控溅射 退火　出处：《激光与光电子学进展》2017年09期 　论文类型：期刊论文

【摘要】：利用ZnS、SnS、CuS三种二元硫化物靶,分步溅射制备了铜锌锡硫(CZTS)薄膜,并在不同温度下进行退火。研究了退火温度对薄膜晶体结构、组分、表面形貌及光学特性的影响。结果表明,当退火温度为400℃时,CZTS薄膜中含有Cu_2S及SnS等多种二次相;随着退火温度的升高,二次相的种类逐渐减少,当退火温度为550℃时,薄膜的表面平整致密,二次相种类最少;然而,当退火温度为600℃时,薄膜表面变得粗糙,二次相种类增多。
[Abstract]:CZTS thin films were prepared by step sputtering with three binary sulphide targets, ZnS- Sn-SnSn-CuS, and annealed at different temperatures. The crystal structure of the films was investigated by annealing temperature. The effect of composition, surface morphology and optical properties. The results show that there are several secondary phases, such as Cu_2S and SnS, in CZTS films when annealing temperature is 400 鈩，

本文编号：1490741