磁控溅射沉积系统设计及SiC-A1薄膜的摩擦特性研究

发布时间：2018-02-09 12:45

本文关键词： SiC-Al 薄膜中间过渡层摩擦特性磨耗界面强度　出处：《郑州大学》2015年硕士论文　论文类型：学位论文

【摘要】：本文利用自主研发的超高真空物理气相沉积设备在基材(Ti-6Al-4V)上沉积出了性能优异的Si C薄膜,并创新性地使用Al过渡层作为薄膜与基材之间的中间层,解决了二者间的结合强度问题;在薄膜中掺杂Al元素成功地解决了Si C薄膜的摩擦性能问题。同时,中间层材料与掺杂材料均为Al元素,可以简化沉积工艺和沉积设备,使得可以用双靶磁控溅射设备完成整个沉积过程,为解决钛铝合金的磨损问题提供了一种可靠的方法。为了满足研究保护性涂层薄膜的需要,本文首先依据研究实践经验和相关技术,完成了射频磁控溅射物理沉积系统(RF-MS PVD)的制造,其中以旋片泵、扩散泵和钛泵组成的三级超高真空系统,可以在30分钟内使0.23立方米的真空室达到1.33×10-6 Pa以上的真空度。本研究中使用Al靶和Si C靶在钛合金基材上溅射沉积得到了无定形的的Si C-Al薄膜,着重研究了Al掺杂含量、中间层厚度和摩擦副材料等参数对薄膜摩擦特性和界面结合强度的影响。当摩擦副为Si C时,随着薄膜中Al原子含量的增加,Si C球与Si C-Al薄膜之间的摩擦系数先降低后增加,在Al原子含量为0.97%mat时,Si C-Al薄膜有最低摩擦系数为0.08;Si C-0.97%mat Al薄膜与SUS304和Al2O3球之间的摩擦系数在0.1左右,而其与SUJ2轴承钢球之间有最低的摩擦系数(0.04-0.07)。通过多次重复实验,确认了这两种材料之间有很低的摩擦系数;磨耗试验中,在Al中间层的厚度超过0.2μm以上时,Si C-Al薄膜的疲劳寿命超过了34000循环,薄膜几乎被磨光,而在此过程中没有出现剥离分层现象,这表明以Al作为Si C-0.97%mat Al与钛合金基材的中间层材料能够很好地改善它们间的界面结合强度。
[Abstract]:In this paper, Si C thin films with excellent properties have been deposited on Ti-6Al-4V substrate by using the self-developed ultra-high vacuum physical vapor deposition equipment. The Al transition layer has been creatively used as the intermediate layer between the thin film and the substrate. The problem of bonding strength between the two films is solved, and the friction properties of sic thin films are successfully solved by doping Al elements into the films. At the same time, both interlayer and doping materials are Al elements, which can simplify the deposition process and deposition equipment. The whole deposition process can be completed by dual-target magnetron sputtering equipment, which provides a reliable method to solve the wear problem of titanium and aluminum alloy. In this paper, based on the practical research experience and related technology, the fabrication of RF-MS PVD (RF magnetron sputtering physical deposition system) has been completed, which consists of a three-stage ultra-high vacuum system consisting of a rotary vane pump, a diffusion pump and a titanium pump. In 30 minutes, the vacuum chamber of 0.23 cubic meters can reach the vacuum degree above 1.33 脳 10 ~ (-6) Pa. In this study, amorphous Si C-Al thin films were deposited on titanium alloy substrate by sputtering Al target and sic target, and Al doping content was emphatically studied. When the friction pair is sic, the friction coefficient between Si C ball and Si C-Al film decreases firstly and then increases with the increase of Al content in the film. When the atomic content of Al is 0.97mat, the lowest friction coefficient of Si C-Al film is 0.08% Si C-0.97mat Al film and SUS304 and Al2O3 ball, but the lowest friction coefficient is 0.04-0.07% between SUJ2 bearing steel ball and Al film. Through repeated experiments, the friction coefficient between Si C-Al film and SUJ2 bearing steel ball is 0.04-0.070.The friction coefficient between Si C-Al film and SUJ2 bearing steel ball is 0.04-0.07. It is confirmed that there is a very low friction coefficient between the two materials, and in the wear test, the fatigue life of Si C-Al thin films exceeds 34000 cycles when the thickness of Al interlayer is more than 0.2 渭 m, and the films are almost polished. However, there is no delamination in the process, which indicates that Al as the interlayer material of Si C-0.97mat Al and Ti alloy substrate can improve the interfacial bonding strength between them.
【学位授予单位】：郑州大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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