烧结NdFeB磁体表面沉积Ni膜及其耐腐蚀性

发布时间：2018-02-21 08:09

本文关键词： 烧结NdFeB 磁控溅射 Ni膜耐腐蚀性能　出处：《材料保护》2017年04期 　论文类型：期刊论文

【摘要】：为改善烧结钕铁硼(NdFeB)磁体的耐腐蚀性能,在磁体表面用磁控溅射方法制备了Ni薄膜。利用扫描电子显微镜(SEM)观察了Ni薄膜的组织形貌,利用电化学测试、中性盐雾试验(NSS)测试了镀膜样品的耐腐蚀性能,研究了溅射功率和负偏压对Ni薄膜组织结构、电化学性能和中性盐雾环境下耐腐蚀性能的影响。结果表明:Ni薄膜的厚度和致密性是影响其耐腐蚀性能的关键因素;随溅射功率增大,Ni薄膜厚度增大,但晶粒尺寸变大、致密性降低,耐腐蚀性能先升高后降低;加负偏压后,Ni薄膜厚度有所减小,但膜层表面更加光滑、组织更加致密均匀,因此镀膜样品耐腐蚀性能有所提高;在溅射功率为100~120 W、负偏压为150 V条件下制备的磁控溅射镀Ni样品具有最好的耐腐蚀性能。
[Abstract]:In order to improve the corrosion resistance of sintered NdFeB magnets, Ni thin films were prepared by magnetron sputtering on the magnets. Neutral salt spray test (NSS) was used to test the corrosion resistance of the coating samples. The sputtering power and negative bias voltage on the microstructure of Ni thin films were studied. The results show that the thickness and densification of the Ni thin films are the key factors affecting the corrosion resistance of Ni films, and the thickness of Ni films increases with the sputtering power, but the grain size increases with the increase of sputtering power. The thickness of Ni film decreases after negative bias voltage, but the surface of the film is smoother and the microstructure is more compact and uniform, so the corrosion resistance of the coating sample is improved. The Ni samples prepared by magnetron sputtering with a sputtering power of 100W and a negative bias voltage of 150V have the best corrosion resistance.
【作者单位】：华南理工大学材料科学与工程学院;
【基金】：教育部新世纪优秀人才项目(NCET-11-0156) 广东省科技计划项目(2014A050503018,2015B010105008) 广州市项目(2014J4100013) 华南理工大学中央高校基本科研业务费项目(2015ZP030)资助
【分类号】：TB306;TM271

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