丁腈橡胶闭合场非平衡磁控溅射制备DLC膜及摩擦性能研究

发布时间：2018-03-10 01:08

本文选题：CFUBMS　切入点：DLC　出处：《哈尔滨工业大学》2015年硕士论文　论文类型：学位论文

【摘要】：类金刚石(DLC)碳膜因具有高的硬度、高耐化学腐蚀性以及低的摩擦系数与磨损率,是一种很有发展潜力的保护涂层。DLC膜主要由C、H原子组成,与橡胶的成分相似,因而两者具有良好的相容性。橡胶密封圈与滚动轴承的配合可以有效防止润滑剂的泄露和灰尘的进入,因而被广泛应用于许多科技领域,如航空、航天、汽车等。但是,动态橡胶密封圈在使用过程中常常因摩擦系数大而严重磨损以致失效。因此,在橡胶上沉积DLC膜层的研究对于保证工程应用和节约能源具有重要的意义。本文利用四个励磁线圈构成闭合场非平衡磁控溅射系统,并采用闭合场非平衡磁控溅射(CFUBMS)法在丁腈橡胶上沉积DLC膜。研究CFUBMS法在不同参数下脉冲偏压电源的电特性;利用两个石墨磁控对靶进行CFUBMS法五因素四水平的正交试验,实验试样进行三次不同的摩擦磨损测试和微观结构检测,分析平均摩擦因数变化、各因素极差和微观结构特点。脉冲偏压电源电特性表明,在CFUBMS(GD)中,随着励磁线圈电流、沉积气压和脉冲基底偏压的增加,基体电流也随之上升,而随着C2H2/Ar流量比的增加,基体电流先逐渐升高后又下降;在CFUBMS(DC)中,基体电流随着励磁线圈和石墨磁控靶电流的增加而增加,随着脉冲基底偏压的增加先增加后保持不变,而随着沉积气压和C2H2/Ar流量比的增加,基体电流先逐渐升高后又下降,出现下降点的原因为偏压电源的过流保护。两种方法中C2H2/Ar流量比对基体电流的影响均出现转折点,证明该因素在膜层沉积中的重要影响作用。摩擦磨损测试结果表明,摩擦加载力和速率增加都会引起摩擦因数上升。当摩擦加载力增加时,摩擦压头压入较深使滞后性摩擦占主导,摩擦因数会突变增加;摩擦速率增加时,粘滞性摩擦占主导,摩擦因数会随时间缓慢上升。对趋势图和极差图的分析得出最佳组合:石墨靶电流1.0A,沉积气压2Pa,C2H2:Ar=1:3,脉冲偏压-200V(80%)。对薄膜摩擦因数影响程度从大到小依次是C2H2/Ar流量比、石墨靶电流、偏压占空比、脉冲偏压大小和沉积气压。橡胶上DLC膜的微观组织结构研究表明,DLC膜的表面一般由网状结构(与sp3键相关)和团簇状结构(与sp2键相关)共同组成。DLC膜层厚度较大和sp2键含量较高时,摩擦因数才能维持在较低的水平。
[Abstract]:Due to its high hardness, high chemical corrosion resistance and low friction coefficient and wear rate, the diamond-like carbon film (DLC) is a potential protective coating. DLC film is mainly composed of Con H atoms and is similar to rubber. The combination of rubber sealing ring and rolling bearing can effectively prevent the leakage of lubricant and the entry of dust, so it is widely used in many fields of science and technology, such as aviation, aerospace, automobile, etc. However, The dynamic rubber seal ring is often worn out because of the high friction coefficient in the process of use. The study on the deposition of DLC film on rubber is of great significance for ensuring engineering application and energy saving. In this paper, four excitation coils are used to form a closed field unbalanced magnetron sputtering system. DLC films were deposited on nitrile rubber by closed field unbalanced magnetron sputtering (DLC) method. The electrical characteristics of pulse bias power supply with different parameters by CFUBMS method were studied, and the orthogonal experiments of five factors and four levels of CFUBMS method were carried out on the target by using two graphite magnetron methods. Three times of different friction and wear tests and microstructure tests were carried out to analyze the variation of average friction coefficient, the difference of various factors and the characteristics of microstructure. The electrical characteristics of pulse bias power supply show that, in CFU BMS GD), with the excitation coil current, The substrate current increased with the increase of deposition pressure and pulse substrate bias voltage. With the increase of C _ 2H _ 2 / ar flow ratio, the substrate current increased first and then decreased; in CFU BMS DC, the substrate current increased at first and then decreased with the increase of the flow ratio of C _ 2H _ 2 / ar. The matrix current increases with the increase of excitation coil and graphite magnetron target current, increases firstly with the increase of pulse substrate bias voltage and then remains unchanged. With the increase of deposition pressure and C _ 2H _ 2 / ar flow ratio, the matrix current increases at first and then decreases. In both methods, the influence of C _ 2H _ 2 / ar flux ratio on the substrate current has reached a turning point, which proves that this factor plays an important role in the deposition of the film. The friction and wear test results show that, The friction coefficient increases with the increase of friction loading force and rate. When the friction load force increases, the friction coefficient will suddenly increase and the friction coefficient will suddenly increase when the friction pressure head is pressed deeper, and the viscous friction dominates when the friction rate increases, and the friction coefficient increases with the increase of friction load force, and the friction coefficient increases with the increase of friction load force. The friction coefficient will rise slowly with time. The analysis of the trend chart and the range chart shows that the best combination is: graphite target current 1.0 A, deposition pressure 2PaA C2H 2: Arg 1: 3, pulse bias voltage -200V ~ (80). The influence on the friction coefficient of the film is in the order of C _ 2H _ 2 / ar flow ratio, graphite target current, and so on. Bias duty cycle, Pulse bias and deposition pressure. The microstructure of DLC film on rubber shows that the surface of DLC film is generally composed of reticular structure (related to sp3 bond) and cluster structure (related to sp2 bond). When the content of Daiwa sp2 bond is high, The friction factor can only be maintained at a lower level.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB306;TQ333.7

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