改善碳纳米管电接触性能的研究进展

发布时间：2018-05-11 16:20

本文选题：碳纳米管 + 电接触性能　；参考：《现代化工》2017年10期

【摘要】：以基于CNT的微纳电子器件为基础,综述了近年来改善CNT与金属电极间电接触性能的研究进展,阐述了各种改善CNT与金属电极间电接触性能方法的原理和优缺点。通过超声波焊接处理、金属颗粒黏结、碳纤维辅助组装、包覆CNT等处理工艺,可以获得阈值电压低、发射电流密度高和稳定性好的CNT场发射器;采用原子层沉积法、溶液处理法、超声波焊接法、高温退火法等可以很好地改善CNT与金属电极间的电接触性能,进而提高CNT晶体管的迁移率、跨导率和通断电流比;化学机械抛光、电子束诱导沉积等处理工艺可以增加CNT和金属电极的接触面积,降低两者间的接触电阻,从而实现高承载电流的CNT互连线。
[Abstract]:Based on the micro / nano electronic devices based on CNT, the research progress of improving the electrical contact performance between CNT and metal electrodes in recent years is reviewed. The principle, advantages and disadvantages of various methods to improve the electrical contact performance between CNT and metal electrodes are described. The CNT field emitters with low threshold voltage, high emission current density and good stability can be obtained by ultrasonic welding, metal particle bonding, carbon fiber auxiliary assembly and CNT coating. Solution treatment, ultrasonic welding, high temperature annealing can improve the electrical contact performance between CNT and metal electrodes, and then improve the mobility, transconductance and on-off current ratio of CNT transistors. The electron beam induced deposition process can increase the contact area between CNT and metal electrode and reduce the contact resistance between them, so that the CNT interconnection with high load current can be realized.
【作者单位】：华北理工大学机械工程学院;
【基金】：国家自然科学基金项目(51472074,51172062) 河北省百人计划项目(E2012100005) 华北理工大学研究生创新项目(2017S26)
【分类号】：TB383.1;TQ127.11

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