USP法制备FTO薄膜及其雾度调控的研究

发布时间：2018-05-11 20:39

本文选题：FTO薄膜 + 超声喷雾热解法　；参考：《燕山大学》2015年硕士论文

【摘要】：本文以单丁基三氯化锡(简称MBTC)为前驱物,氟化铵为掺杂剂,采用超声喷雾热解法,在加热的载玻片上制备掺氟氧化锡薄膜。通过改变基板温度,喷涂时间,前驱物MBTC浓度,分析其对FTO薄膜微观形态以及光电性能的影响,本实验分别采用X射线衍射仪测定并分析薄膜晶化程度和择优生长等结构特点;采用冷场发射扫描电镜观察薄膜表面形貌与断面形貌,并分析薄膜颗粒形状、尺寸以及膜厚的变化;采用原子力显微镜观察FTO薄膜表面颗粒的起伏情况及三维形貌,分析薄膜表面粗糙度的变化;采用紫外-可见光分光光度计及方阻仪分别测定薄膜在可见光范围内的平均透射比和方块电阻,并引用品质因数对薄膜的光电性能作出综合评价;采用雾度仪测定薄膜在可见光范围内的雾度值,并进一步探究薄膜雾度随晶体结构与表面形貌的变化规律。实验结果表明:不同实验条件下制备的FTO薄膜均为多晶四方金红石结构SnO2。随基板温度的升高,薄膜的择优取向由(200)晶面转变为(301)晶面。薄膜厚度、表面颗粒尺寸和表面粗糙度则随着基板温度和前驱物MBTC浓度的升高先增大后减小,随喷涂时间的增加而不断增大。当薄膜厚度、表面颗粒尺寸和表面粗糙度分别为1480 nm、539 nm和54.98 nm时,雾度值最大,达到36.79%。综合考虑薄膜的光电性能以及雾度,得到绒面FTO薄膜的最佳制备条件为基板温度530°C、喷涂时间5 min和MBTC浓度1.5 mol%,在该条件下薄膜的品质因数和雾度分别为21.8×10-3Ω-1和12.66%。
[Abstract]:In this paper, tin fluoride doped tin oxide thin films were prepared on heated glass by ultrasonic spray pyrolysis with MBTCc as precursor and ammonium fluoride as dopant. By changing the substrate temperature, spraying time and MBTC concentration of precursor, the influence of the film on the microstructure and optoelectronic properties of FTO film was analyzed. The crystallization degree and preferential growth of the film were measured and analyzed by X-ray diffraction. The surface morphology and cross-section morphology of FTO films were observed by cold field emission scanning electron microscopy (SEM), and the changes of particle shape, size and film thickness were analyzed, and the undulation and 3D morphology of FTO films were observed by atomic force microscope (AFM). The change of surface roughness is analyzed, the average transmittance and square resistance in visible range are measured by UV-Vis spectrophotometer, and the photoelectric properties of the films are evaluated by using quality factor. The foggy values of the thin films in the visible range were measured by a foggy meter, and the variation of the foggy with the crystal structure and the surface morphology of the films was further investigated. The experimental results show that the FTO films prepared under different experimental conditions are all polycrystalline tetragonal rutile Sno _ 2. With the increase of substrate temperature, the preferred orientation of the film changes from the crystal plane of 200 to the crystal plane of 301. The film thickness, surface particle size and surface roughness increase firstly and then decrease with the increase of substrate temperature and precursor MBTC concentration, and increase with the increase of spraying time. When the film thickness, surface particle size and surface roughness are 1480 nm and 54.98 nm, respectively, the maximum haze value is 36.79 nm. Considering the optoelectronic properties and fogging of the films, the optimum preparation conditions were obtained as follows: substrate temperature 530 掳C, spray time 5 min and MBTC concentration 1.5 mol. The film quality factor and fogging degree were 21.8 脳 10 ~ (-3) 惟 -1 and 12.66 cm ~ (-1), respectively.
【学位授予单位】：燕山大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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