掺W类金刚石薄膜的高温摩擦学行为

发布时间：2018-05-12 00:14

  本文选题：掺杂 + 类金刚石薄膜　； 参考：《摩擦学学报》2017年03期

【摘要】：采用阳极层流型离子源结合非平衡磁控溅射技术制备了含氢掺钨类金刚石(W-DLC)薄膜,利用TEM、SEM、XRD、Raman光谱仪和摩擦磨损试验机等方法分析了薄膜的结构、形貌以及在高温下的摩擦学性能,探讨了W-DLC薄膜在高温下摩擦磨损行为作用机理.结果表明:W-DLC薄膜中钨原子以WC1-x纳米晶团簇的形式随机分布于碳基质中,增强了薄膜的韧性.W-DLC薄膜在25~200℃范围内的摩擦系数可稳定在0.1以下,在300℃时的摩擦系数则高达0.5,当试验温度进一步升高到400℃时,薄膜的摩擦系数反而降低至0.3左右,当试验温度升高到500℃时,W-DLC薄膜中的W被氧化生成WO_3和摩擦诱导生成的石墨共同作用,使得薄膜的摩擦系数降到0.15左右,说明W-DLC薄膜在高温下仍然具有优异的减摩特性.然而,W-DLC薄膜的磨损率在25~500℃范围内表现出随着温度的升高而不断增大的趋势.
[Abstract]:W-DLC thin films containing hydrogen were prepared by anodic laminar ion source and unbalanced magnetron sputtering. The structure, morphology and tribological properties of the films at high temperature were analyzed by means of Tem SEMX XRDX Raman spectrometer and friction and wear tester. The mechanism of friction and wear behavior of W-DLC films at high temperature was discussed. The results show that tungsten atoms are randomly distributed in carbon matrix in the form of WC1-x nanocrystalline clusters in the W W DLC film, and the friction coefficient of the W DLC film can be stabilized below 0. 1 at 25 ~ 200 鈩，

本文编号：1876265