双频大气压冷等离子体射流沉积薄膜的基础研究

发布时间：2018-05-20 02:14

本文选题：大气压等离子体射流 + 沉积薄膜　；参考：《西北师范大学》2015年硕士论文

【摘要】：大气压冷等离子体射流(APPJ)沉积薄膜的技术是一种设计简单,容易起辉,易于维持,运行稳定,重复性高,无污染的新型镀膜工具。其无需腔体和真空设备具有无空间限制性,大大降低了成本,提高了使用的灵活性,有利于连续化的生产加工和小型化便携式的使用。双频(DF)驱动的大气压冷等离子体射流结合了低频(LF)和射频(RF)单个频率驱动的等离子体射流的优点。双频(DF)驱动的大气压等离子体射流较单频驱动的等离子体射流具有等离子体羽长、气体温度低、电子密度高及化学活性强的优势。所以其作为一项镀膜的工具,具有更高的灵活性和高效性,具有一定的现实意义和应用价值。基于这样的优势,本文设计了双频驱动大气压等离子体射流沉积系统。利用不同双频驱动组合(50kHz/2MHz和50kHz/33MHz)的大气压冷等离子体射流,分别以丙酮(CH3COCH3)和正硅酸乙酯(TEOS,Si(OC2H5)4)为原料气体,在常压大气环境中沉积得到聚合物CHxOyNz薄膜和有机硅薄膜。实验中,以氩气(Ar)作为原料气体的载气,通过调节载气流量来控制携带入等离子体发生区域的原料气体的含量。通过光谱检测的手段发现,在实验中原料气体分子将发生裂解和再复合,从而产生很多活性基团。随着原料气体含量的增多,等离子体中活性基团的光谱强度先增加,达到最大值之后又逐渐减小。活性基团强度越高,说明等离子体的化学活性越强,这就越利于沉积薄膜。所以本文中对沉积条件(先驱体的流量和等离子体的发生功率)进行了优化,在较优条件下成功地沉积了薄膜。通过扫描电子显微镜(SEM)、傅里叶变换红外光谱(FT-IR)、以及X射线光电子能谱(XPS)对所沉积薄膜的表面形貌,主要的化学键及化学元素进行表征。
[Abstract]:The deposition technology of APPJ thin film by atmospheric pressure cold plasma jet is a new kind of coating tool which is simple in design, easy to shine, easy to maintain, stable in operation, high in repeatability and free from pollution. It has no space restriction without cavity and vacuum equipment, greatly reduces the cost, improves the flexibility of use, and is propitious to continuous production and miniaturization of portable use. The dual-frequency DFF-driven atmospheric pressure cold plasma jet combines the advantages of the low-frequency plasma jet and the RF) plasma jet driven by a single frequency. The atmospheric pressure plasma jet driven by dual-frequency plasma jet has the advantages of long plasma plume, low gas temperature, high electron density and strong chemical activity. Therefore, as a coating tool, it has higher flexibility and efficiency, and has certain practical significance and application value. Based on this advantage, a dual frequency driven atmospheric pressure plasma jet deposition system is designed. Polymer CHxOyNz thin films and organosilicon films were deposited under atmospheric pressure using acetone CH3COCH3 (acetone) and ethyl orthosilicate (TEOS SiC _ 2H _ 2H _ 5H _ 4) as raw gases by using different dual-frequency driving combinations of 50kHz / 2MHz and 50kHz / 33MHz. respectively. In the experiment, the content of the raw gas carried into the region of plasma generation was controlled by adjusting the flow rate of the carrier gas using Argon as the carrier gas. It is found by spectral detection that the raw gas molecules will be cracked and recombined in the experiment, and many active groups will be produced. With the increase of raw gas content, the spectral intensity of the active group in the plasma increases first, reaches the maximum value, and then decreases gradually. The higher the strength of the active group is, the stronger the chemical activity of the plasma is, and the more favorable the deposition is. Therefore, the deposition conditions (the flux of precursor and the power of plasma generation) are optimized in this paper, and the thin films are successfully deposited under the optimum conditions. The surface morphology, main chemical bonds and chemical elements of the films were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS).
【学位授予单位】：西北师范大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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