大尺寸平面磁控靶高功率脉冲放电的近基底表面光谱研究

发布时间：2018-05-27 05:36

本文选题：高功率脉冲磁控溅射 + 近基底表面区域　；参考：《表面技术》2017年06期

【摘要】：目的探索高功率脉冲磁控溅射方法在大尺寸平面磁控溅射Cr靶过程中,近基底表面等离子体区域内的活性粒子分布特性以及辐射跃迁过程,为HiPIMS的规模化应用提供实验基础和理论依据。方法选择不同高功率脉冲溅射脉冲电压、工作气压和耦合直流等关键沉积参数,采用等离子体发射光谱仪测量近基底表面等离子体区域内的光学发射光谱,分析原子特征谱线的种类、强度分布、离子谱线强度百分比、金属原子谱线含量等。结果当脉冲电压到达700 V后,基底表面的等离子体区域内的金属离化率显著提高;脉冲电压为600 V时,适当增加工作气压至5.0 mTorr,能有效提高到达基底的Cr激发态粒子含量,工作气压的升高会降低金属离化率。增加耦合直流在一定程度上降低了能到达基底的活性Cr~+和Cr~*原子含量,为了保持一定的活性粒子比例,耦合直流应当小于1.0 A。结论大面积高功率脉冲磁控溅射中的近表面等离子体区域内的主要活性粒子为Ar~+和Cr~*激发态原子,其主导的碰撞过程为Ar~+的电离复合过程和Cr~*的退激发过程,金属离化率还有待提高。
[Abstract]:Aim to investigate the distribution characteristics of active particles and the radiative transition process in the plasma region near the substrate surface in the large scale planar magnetron sputtering Cr target by high power pulsed magnetron sputtering. To provide experimental and theoretical basis for the large-scale application of HiPIMS. Methods the key deposition parameters, such as pulse voltage, working pressure and coupling DC, were selected to measure the optical emission spectra in the plasma region near the substrate surface by plasma emission spectrometer. The types of atomic characteristic lines, intensity distribution, ion spectral line intensity percentage, metal atomic spectral line content and so on are analyzed. Results when the pulse voltage reaches 700V, the metal ionization rate in the plasma region of the substrate surface increases significantly, and when the pulse voltage is 600 V, the content of Cr excited particles reaching the substrate can be effectively increased by properly increasing the working pressure to 5.0 mTorr. The higher the working pressure, the lower the metal ionization rate. In order to keep a certain proportion of active particles, the coupling DC should be less than 1.0 A. Conclusion the main active particles in the near surface plasma region of large area high power pulsed magnetron sputtering are the excited atoms of Ar- and Cr-*, and the dominant collision process is the ionization recombination process of Ar~ and the de-excitation process of Cr-O *. The ionization rate of metals needs to be improved.
【作者单位】：中国科学院宁波材料技术与工程研究所中国科学院海洋新材料与应用技术重点实验室;中国科学院宁波材料技术与工程研究所浙江省海洋材料与防护技术重点实验室;天津职业技术师范大学天津市高速切削与精密加工重点实验室;
【基金】：国家自然科学基金项目(51375475,51301181) 江西省重大研发专项(2015XTTD03,20161ACE50023)~~
【分类号】：TB306

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