硫化锌薄膜材料的制备及物性研究

发布时间：2018-05-28 19:49

  本文选题：射频磁控溅射 + 硫化锌薄膜　； 参考：《北京工业大学》2015年硕士论文

【摘要】：硫化锌薄膜以其直接带隙材料、禁带宽度较大和无色透明等特点被广泛用于在气敏传感、湿敏传感、透明导电薄膜、太阳能电池等领域。硫化锌作为铜锌锡硫薄膜太阳能电池的窗口层,其制备和掺杂研究是目前国际上的研究热点之一。本文主要研究硫化锌薄膜材料的制备与物性研究等内容。采用射频磁控溅射技术,以纯度99.999%的ZnS靶为靶材,在玻璃衬底上沉积ZnS薄膜。改变沉积时间,以半个小时为时间间隔,沉积时间分别为1,1.5,2,2.5h,得到不同沉积时间下的ZnS薄膜。利用X射线衍射、椭圆偏振光谱、扫描电镜(SEM)等方法对薄膜样品进行研究。结果发现不同沉积时间得到的薄膜均为(111)取向的β-ZnS;并且沉积时间越长,则薄膜颗粒越小。由椭偏仪拟合n值可以看出,在1.461-2.885ev的拟合范围中,ZnS的折射率在2.12-2.40之间,折射率随光的能量的增大而增大。并且随着沉积时间的增长,薄膜厚度增加,折射率增大。改变衬底温度,用射频磁控溅射技术,在玻璃衬底上制备出ZnS薄膜。研究衬底温度对薄膜性能的影响。结果发现当温度为200℃时,晶粒的尺寸最大,为28.96nm。通过椭圆偏振分析,ZnS薄膜在可见光范围内折射率介于2.08~2.40,并随衬底温度升高而增大;光致发光谱表明,所制备ZnS薄膜紫外发射主要是由导带和Zn空位之间的电子跃迁导致的。此外我们还尝试采用溶胶-凝胶法制备铜锌锡硫薄膜此外,我们用相分离下的标准渗流模式对前期制备的La0.9Sb0.1MnO3薄膜的电输运结果进行研究,结果拟合较好。这表明可以用相分离下的渗流输运解释La0.9Sb0.1MnO3薄膜体系的磁电阻来源。
[Abstract]:Zinc sulfide thin films are widely used in gas sensing, humidity sensing, transparent conductive thin films, solar cells and other fields due to their direct bandgap material, wide band gap and colorless transparency. The preparation and doping of zinc sulphide as the window layer of copper, zinc, tin and sulfur thin film solar cells is one of the hot spots in the world. In this paper, the preparation and physical properties of zinc sulfide thin film are studied. ZnS thin films were deposited on glass substrates by radio frequency magnetron sputtering (RF magnetron sputtering) with a purity of 99.999% ZnS target. The deposition time was changed to half an hour interval, and the deposition time was 111.5 ~ 22.5 h, respectively. The ZnS thin films were obtained at different deposition times. The thin film samples were studied by means of X-ray diffraction, elliptical polarization spectroscopy and scanning electron microscope (SEM). The results show that the films obtained at different deposition times are all 尾 -ZnS with orientation of 111), and the longer the deposition time is, the smaller the particle size of the films is. It can be seen from the ellipsometer fitting that the refractive index of 1.461-2.885ev increases with the increase of light energy in the range of 2.12-2.40. With the increase of deposition time, the thickness and refractive index of the films increase. ZnS thin films were prepared on glass substrates by RF magnetron sputtering at different substrate temperature. The effect of substrate temperature on the properties of the films was studied. The results show that when the temperature is 200 鈩，

本文编号：1947959