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日盲紫外带通滤光片膜系设计与镀膜工艺研究

发布时间:2018-09-08 18:34
【摘要】:本文以制备高性能日盲紫外带通滤光片为目标,利用光学膜系设计理论、Opti Layer软件、OPTUS-700电子束真空沉积设备及多种现代物理分析方法,从膜系设计、镀膜工艺、样片制备和性能表征几个环节进行了系统研究。在对国内外紫外带通滤光片发展现状和技术特点分析的基础上,确定了在紫外融石英基底双侧分别镀制主膜系和辅助膜系的设计方案,高折射率材料选Hf O2,低折射率材料选Mg F2。通过膜系设计与优化,得到具体膜系结构。计算表明,所设计的全介质膜日盲紫外带通滤光片在240-280nm波段具有极高的透过率,截止带的宽度和截止度满足设计要求。在确定了合适的沉积速率、真空度等工艺参数后,重点研究了不同沉积温度下Hf O2和Mg F2两种薄膜光学性能与微观结构的关系。当沉积温度低于150℃时,Hf O2薄膜呈非晶态,温度达到150℃后,出现结晶倾向。随沉积温度升高,结晶程度增大,晶粒尺寸减小,同时填充密度增加,折射率变大,可见光波段中心波长透过率极值减小。同时,随着温度升高,Hf O2薄膜化学计量比失配程度加剧,紫外波段吸收损耗增加,消光系数增大。Mg F2薄膜则为具有四方晶系结构的尖顶柱状晶,随沉积温度升高,晶粒逐渐长大,表面粗糙度增大,导致散射损耗增加和透过率降低。通过对上述研究结果的分析,综合考虑两种光学薄膜的光学性能和微观结构,确定紫外滤光片的最佳沉积温度为200℃。依据设计方案,利用合适的镀膜工艺,制备出日盲紫外滤光片样品。评价结果表明,该滤光片在通带的平均透射率达到50%,两侧截止带宽度和截止度均接近设计方案,而且滤光片具有优良的光学稳定性和机械性能。
[Abstract]:The aim of this paper is to prepare high performance solar blind ultraviolet bandpass filters, using optical film system design theory and Opti Layer software OPTUS-700 electron beam vacuum deposition equipment and various modern physical analysis methods, from film system design and coating process. Several aspects of sample preparation and performance characterization were systematically studied. Based on the analysis of the development status and technical characteristics of ultraviolet bandpass filter at home and abroad, the design scheme of main film system and auxiliary film system plating on both sides of ultraviolet fused quartz substrate is determined. The material with high refractive index is selected as Hf O 2, and Mg F 2 with low refractive index material is selected. Through the design and optimization of the membrane system, the concrete structure of the membrane system is obtained. The calculation results show that the all-dielectric film diurnal blind ultraviolet bandpass filter has a very high transmittance in the 240-280nm band, and the width and cut-off degree of the cutoff band can meet the design requirements. The relationship between the optical properties and microstructure of Hf _ O _ 2 and Mg _ F2 films at different deposition temperatures was studied after the appropriate deposition rate, vacuum and other technological parameters were determined. When the deposition temperature is lower than 150 鈩,

本文编号:2231350

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