基于扩展Zernike多项式的投影物镜全视场像差优化研究

发布时间：2018-01-13 18:21

本文关键词：基于扩展Zernike多项式的投影物镜全视场像差优化研究　出处：《中国科学院研究生院（光电技术研究所）》2015年硕士论文　论文类型：学位论文

【摘要】：投影物镜是光刻机最为核心的分系统,其设计和制造的技术难度极大。投影物镜具有高NA、大视场的特点,对成像质量要求极高,达到了光学衍射极限。在投影物镜的制造过程中,加工公差和装调公差也都要求极为严格。因此,在投影物镜的设计与制造过程中,像质评价和像质补偿极为重要。像质评价贯穿整个投影物镜的设计过程,是系统优化和像质补偿的重要依据。像质补偿可以确保实现投影物镜的各项技术指标,协调各阶段的关键技术,降低制造成本。本文引入了一种新的多项式表示投影物镜的全局波像差分布,分析了相关多项式的像差特性,并将基于该多项式建立全视场补偿数学模型应用于投影物镜的计算机辅助装调过程中。本文主要针对Zernike多项式在描述投影物镜综合像差特性的不足,在Zernike多项式的基础上扩展了一种新的多项式表示投影物镜的全视场像差分布-正交像差函数(OAF);利用OAF分别描述了投影物镜在含加工误差和不含加工误差下的全视场像差分布;对比分析了OAF表示的准确性和波像差特性。OAF能够对光刻物镜的像差进行更细的分类和量化,不仅可以描述共轴光学系统的旋转对称像差,还可以描述非共轴光学系统的波像差特性。研究了基于OAF全视场函数的灵敏度矩阵法在投影物镜的计算机辅助装调技术中的应用。正交像差函数不仅很好地建立系统波像差与视场坐标之间的联系,还能很好地通过多项式系数的变化反应元件的失调量大小。以OAF多项式系数建立的灵敏度矩阵克服了视场条件的限制,简化了投影物镜元件失调量补偿的数学模型,降低了补偿量的求解难度。在仿真实验中,运用OAF建立的数学模型分别求解了投影物镜在含加工误差下和不含加工误差下随机装调误差的补偿量,优化投影物镜在元件失调情况下的像差,验证了基于OAF全视场像差优化模型的可行性,为实际中投影物镜装调提供理论基础。
[Abstract]:Projection objective lens is the most core subsystem of lithography machine, its design and manufacture technology is very difficult. Projection objective lens has the characteristics of high NAand large field of view, and requires very high imaging quality. The optical diffraction limit is reached. In the manufacturing process of projection objective lens, the machining tolerance and the adjustment tolerance are also very strict. Therefore, in the design and manufacture of projection objective lens. Image quality evaluation and image quality compensation are very important. Image quality evaluation runs through the design process of projective objective lens and is an important basis for system optimization and image quality compensation. Image quality compensation can ensure the realization of various technical indicators of projection objective lens. In this paper, a new polynomial is introduced to represent the global wave aberration distribution of the projection objective lens, and the aberration characteristics of the related polynomial are analyzed. The full field compensation mathematical model based on the polynomial is applied to the computer-aided adjustment of projection objective lens. This paper aims at the deficiency of Zernike polynomial in describing the comprehensive aberration characteristics of projection objective lens. . Based on the Zernike polynomials, a new polynomial is extended to represent the total field aberration distribution of the projection objective lens, which is called orthogonal aberration function. The distribution of total field aberration of projection objective lens with and without machining error is described by OAF. Comparing and analyzing the accuracy of OAF representation and wave aberration. OAF can classify and quantify the aberration of lithographic objective lens more finely, and can not only describe the rotational symmetry aberration of coaxial optical system. The application of sensitivity matrix method based on OAF full field of view function in the computer-aided adjustment of projection objective lens is studied. The orthogonal aberration function is not only very good, but also can be used to describe the wave aberration characteristics of non-coaxial optical system. The relationship between the system aberration and the field of view coordinates is established. The sensitivity matrix established by OAF polynomial coefficient can overcome the limitation of field of view condition. The mathematical model of offset compensation for projective objective elements is simplified, and the difficulty of solving the compensation is reduced. By using the mathematical model established by OAF, the compensation amount of the random mounting error of projection objective lens with and without machining error is solved, respectively, and the aberration of projection objective lens under the condition of component misalignment is optimized. The feasibility of the optimization model based on OAF full field aberration is verified, which provides a theoretical basis for the actual projection objective.
【学位授予单位】：中国科学院研究生院（光电技术研究所）
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7

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