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光刻机换台过程控制算法研究

发布时间:2018-01-18 01:30

  本文关键词:光刻机换台过程控制算法研究 出处:《哈尔滨工业大学》2015年硕士论文 论文类型:学位论文


  更多相关文章: 电机模型 复合控制 变结构控制 误差模型


【摘要】:光刻机系统集合了多种学科,涉及控制、测量、检测、光学、电气等各个专业领域,代表一个国家集成制造领域的最高水平。光刻机运行性能的提高需要光学测量的准确性,光刻机运行的稳定受制于电气装置的稳定性,光刻机运行的精度依赖于控制算法的选取。选取适合光刻机运行状态的控制算法是保证光刻机在高频响、高精度运行环境下的关键。精密运动平台作为光刻机的基础部分,上面驮载着掩膜台和硅片台。精密运动平台采用了H型结构,换台过程就是在此运动平台上完成的。换台过程是整个光刻机运行的关键步骤。换台步骤的失败将直接导致光刻机系统的失败,并且将会对换台所需机械部分造成损伤,因此必须细致的分析光刻机系统的换台过程才能够获得精密控制方法。整个换台的步骤需要公转电机、自转电机以及X、Y向电机的精密配合。X、Y向的电机为旋转电机进行换台动作提供空间,因此需要精确的定位。因此首先分析了直线电机,从线性模型和非线性模型建立了直线电机的数学模型,然后根据项目的发展要求,采用了复合控制策略对其进行控制,分别为前馈控制、反馈控制、径向基函数。公转电机是整个换台过程的核心,连接着左右两侧的自转电机,一方面完成旋转动作,另一方面控制着自转电机的位置精度,使其能够正常的对X向电机完成空间上的位置匹配。公转电机在实际运行中控制结构不断发生变化,建立公转电机的数学模型以后,采用了变结构的控制策略,并通过仿真进行验证。在光刻机换台过程中,机械部分的误差积累一直是一个难题,将直接使得机械器件之间不能够精确的匹配,会造成机械部分的相互触碰,损伤机械部分装置,换台过程是一个多体过程,通过引入多体系统,利用齐次坐标的方式建立了换台过程中所需器件的位置表达式,进而来确定光刻机系统中器件之间的相对位置,从而进行误差补偿。在换台过程中的调试中,精密运动平台运行十分良好,方便光刻机换台过程中的控制系统的调试,有利于换台步骤控制算法的验证。
[Abstract]:Lithography system is a collection of a variety of disciplines, including control, measurement, detection, optics, electrical and other professional fields. It represents the highest level in the field of integrated manufacturing in a country. The improvement of the performance of the lithography machine requires the accuracy of optical measurement, and the stability of the lithography machine is limited by the stability of the electrical device. The operation accuracy of lithography machine depends on the selection of control algorithm. The choice of control algorithm suitable for the operation state of lithography machine is to ensure the high frequency response of lithography machine. Precision motion platform is the basic part of lithography machine, which is loaded with mask and silicon chip platform. The precision motion platform adopts H-type structure. The switch process is completed on this moving platform. The replacement process is the key step of the whole lithography machine operation. The failure of the replacement step will directly lead to the failure of the lithography system. And it will cause damage to the mechanical part of the platform change, so we must analyze the process of the lithography system to obtain the precision control method. The whole step of changing the platform needs the rotary motor. The rotation motor and the XY direction motor provide the space for the rotating motor to change the platform, so the precise positioning is needed. Therefore, the linear motor is analyzed firstly. The mathematical model of linear motor is established from the linear model and the nonlinear model. Then according to the development requirements of the project, the compound control strategy is used to control the linear motor, which are feedforward control and feedback control respectively. Radial basis function. The rotary motor is the core of the whole stage change process, connected to the left and right sides of the rotation motor, on the one hand complete the rotation action, on the other hand, control the position accuracy of the rotation motor. So that it can normally complete the space position matching of the X-direction motor. The control structure of the rotary motor changes constantly in the actual operation. After establishing the mathematical model of the rotating motor, the variable structure control strategy is adopted. The error accumulation of the mechanical part is always a difficult problem in the process of the lithography machine changing, which will directly make the mechanical parts can not be accurately matched, which will cause the mechanical parts to touch each other. The mechanical part of the damage, the replacement process is a multi-body process, through the introduction of multi-body system, using homogeneous coordinates to establish the position of the required device in the process of platform change expression. Then to determine the relative position of the components in the lithography system, so as to compensate for the error. In the process of debugging, the precision moving platform runs very well. It is convenient to debug the control system in the process of changing the lithography machine and to verify the step control algorithm.
【学位授予单位】:哈尔滨工业大学
【学位级别】:硕士
【学位授予年份】:2015
【分类号】:TN305.7

【参考文献】

相关期刊论文 前2条

1 李信栋;苟兴宇;;多体卫星MIMO控制及稳定裕度研究[J];航天控制;2013年05期

2 王小飞;英国的纳米技术研究[J];全球科技经济w,

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