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磷化铟三维纳米阵列结构制备及特性研究

发布时间:2018-01-30 13:18

  本文关键词: 多孔磷化铟 三维有序纳米阵列 径向多孔结构簇 双光束双曝光 出处:《长春理工大学》2015年硕士论文 论文类型:学位论文


【摘要】:本文主要介绍了电化学振荡的可调控性及其在三维有序纳米阵列结构制备中的应用。基于可调控电化学振荡以及电化学振荡与三维结构存在密切的对应关系,制备了InP三维有序阵列结构材料。通过施加干扰调控电化学振荡行为,探索InP三维有序阵列结构内部的缺陷设计和制备。利用双光束双曝光制备掩膜,实现诱导电化学刻蚀InP制备多孔结构并去除不规则多孔结构。分析了双光束双曝光得到的掩膜特征尺寸和周期对电化学刻蚀InP多孔结构形貌的影响。分析电化学刻蚀InP过程中出现的径向多孔结构簇的形成原因,并利用空间电荷层理论分析孔壁的成因。
[Abstract]:In this paper, the controllability of electrochemical oscillation and its application in the preparation of three-dimensional ordered nanoarrays are introduced. Based on the close relationship between the three dimensional structure and the controllable electrochemical oscillation and electrochemical oscillation. InP three-dimensional ordered array structure materials were prepared. The defect design and fabrication of InP three-dimensional ordered array structure were investigated by applying interference to regulate the electrochemical oscillation behavior. Double beam double exposure was used to prepare the mask. The effect of the characteristic size and period of mask obtained by double beam double exposure on the morphology of porous structure of electrochemically etched InP was analyzed. The formation of radial porous structure clusters in electrochemical etching of InP. The formation of the pore wall is analyzed by the space charge layer theory.
【学位授予单位】:长春理工大学
【学位级别】:硕士
【学位授予年份】:2015
【分类号】:TN304.2

【引证文献】

相关期刊论文 前1条

1 梁凯华;;电化学刻蚀InP过程中电流密度对刻蚀深度的影响[J];科技创新与应用;2017年11期



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