基于SOI光学谐振腔的表面光滑机理及其关键技术研究

发布时间：2018-02-10 02:40

本文关键词： 谐振腔侧壁粗糙度高温氧化损耗品质因数　出处：《中北大学》2015年硕士论文　论文类型：学位论文

【摘要】：基于绝缘体上硅SOI(Silicon-on-insulator，SOI)的光学谐振腔因其具有集成度高、功耗低、灵敏度高等特点而广泛应用在光学通信、光学互联以及高灵敏度传感器等技术领域，有着重要的现实意义和潜在应用价值。然而光波导器件由于制备过程中不可避免的粗糙侧壁的存在，使其散射损耗较大，严重制约了大尺寸、高品质因数Q(Quality Factor)光学谐振腔的实现。因此，本文从SOI光波导表面光滑机理展开讨论，探究降低波导侧壁粗糙度，提高其品质因数的优化方法。首先，文章对光学谐振腔的耦合传输理论进行了详细的分析与阐述，并介绍了衡量光学微腔谐振特性的几个重要指标，同时从工艺制备角度揭示了侧壁粗糙度的产生机理，并从理论上分析了粗糙度对光学谐振腔传输损耗及谐振特性的影响；其次，通过微机电系统MEMS(Micro-electro-mechanical-systems)技术制备了SOI圆环型和跑道型谐振腔，并对制备流程进行了简要说明；通过对高温热氧化工艺原理分析及其对波导侧壁光滑处理的优势，我们制定了单次氧化和分级氧化工艺方案，并通过去除金属标记、氧化及后续的腐蚀实验完成了光滑处理过程。最后，我们搭建了耦合实验测试平台，对两种氧化工艺前后的光学微腔的传输性能进行了测试与分析，验证了热氧化工艺对于波导表面光滑优化的重要作用；最重要的是，，相比单次氧化工艺，分级氧化工艺对于降低波导传输损耗、提高谐振腔品质因数方面具有更大的优势。本研究不仅为低损耗、大尺寸、高Q值的光学谐振腔的实现奠定了重要的研究基础，对于微光学器件、光网络、光通讯，特别是对于纳米光波导陀螺等新型器件的研制，更具有重要的研究意义和科学价值。
[Abstract]:Because of its high integration, low power consumption and high sensitivity, the optical resonator based on silicon SOI on insulator has been widely used in optical communication, optical interconnection and high sensitivity sensors. It has important practical significance and potential application value. However, due to the inevitable existence of rough sidewalls in the fabrication process, the scattering loss of optical waveguide devices is large, which seriously restricts the large size. The realization of high quality Q quality factor optical resonator. Therefore, this paper discusses the surface smoothing mechanism of SOI optical waveguide, and explores the optimization method to reduce the roughness of the side wall of the waveguide and improve its quality factor. First of all, the coupling transmission theory of optical resonator is analyzed and expounded in detail, and several important indexes to measure the resonance characteristics of optical microcavity are introduced. At the same time, the mechanism of side wall roughness is revealed from the point of view of process preparation. The influence of roughness on the transmission loss and resonant characteristics of optical resonator is analyzed theoretically. Secondly, SOI ring resonators and runway resonators are fabricated by MEMS Micro-electro-mechanical-systems technology, and the fabrication process is briefly explained, and the advantages of high temperature thermal oxidation technology and smooth treatment of waveguide side wall are analyzed. The single oxidation and step oxidation processes were worked out, and the smooth treatment process was completed by removing metal marks, oxidation and subsequent corrosion experiments. Finally, we build a coupled experimental test platform to test and analyze the transmission performance of the optical microcavity before and after the two oxidation processes. The results show that the thermal oxidation process plays an important role in the smooth optimization of the waveguide surface, and the most important is that the thermal oxidation process plays an important role in the smooth optimization of the waveguide surface. Compared with the single oxidation process, the step oxidation process has more advantages in reducing the waveguide transmission loss and improving the quality factor of the resonator. This study not only lays an important foundation for the realization of optical resonators with low loss, large size and high Q value, but also for the development of micro optical devices, optical networks, optical communication, especially nanoscale optical waveguide gyroscopes, etc. More important research significance and scientific value.
【学位授予单位】：中北大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN629.1

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