极紫外光刻机多层膜反射镜表面碳污染的清洗

发布时间：2018-03-31 20:03

本文选题：极紫外光刻机　切入点：碳污染　出处：《光学精密工程》2017年11期

【摘要】：针对极紫外(EUV)光刻机工作过程中,多层膜反射镜表面沉积碳污染造成的反射率下降问题展开研究,讨论了多层膜反射镜表面碳污染清洗方法。首先描述了在EUV曝光过程中多层膜表面的碳污染形成过程,简单阐述了碳污染对多层膜反射镜的危害。然后从清洗机理、速率以及效果等方面详细描述了多种EUV多层膜表面碳污染清洗方法,分析对比了各清洗技术在清洗速率和效果等方面的优缺点。分析表明:离子体氧和活化氧清洗速率相差不多,可达到2nm/min,但清洗过程中容易造成表面氧化;等离子体氢和原子氢的清洗速率相对较慢,一般在0.37nm/min左右,但清洗过程中不易产生氧化。最后针对不同方法应用于在线清洗EUV多层膜反射镜过程中将遇到的问题和难点进行了讨论。
[Abstract]:In this paper, the reduction of reflectance caused by carbon pollution on the surface of multilayer mirror is studied in the course of working on the ultra-ultraviolet (UV) EUV lithography machine. The cleaning method of carbon pollution on the surface of multilayer mirror is discussed. Firstly, the formation process of carbon pollution on the surface of multilayer film during EUV exposure is described, and the harm of carbon pollution to multilayer mirror is briefly described. The cleaning methods of carbon pollution on the surface of EUV multilayer membrane are described in detail in terms of rate and effect. The advantages and disadvantages of each cleaning technology in cleaning rate and effect are analyzed and compared. The results show that the cleaning rate of ion body oxygen is not different from that of activated oxygen, which can reach 2 nm / min, but it is easy to cause surface oxidation during cleaning process. The cleaning rate of plasma hydrogen and atomic hydrogen is relatively slow, generally around 0.37nm/min. However, it is difficult to produce oxidation in the process of cleaning. Finally, the problems and difficulties that will be encountered in the process of on-line cleaning EUV multilayer mirror with different methods are discussed.
【作者单位】：中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室;
【基金】：国家科技重大专项资助项目(No.2012ZX02702001) 国家自然科学基金资助项目(No.61404139) 应用光学国家重点实验室自主基金资助项目(No.Y5743FQ158) 吉林省重点科技成果转化项目(No.20150307039GX)
【分类号】：TN23

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