电子束光刻的三维微结构的模拟计算

发布时间：2018-05-11 22:36

本文选题：电子束光刻 + 微结构　；参考：《东南大学》2016年硕士论文

【摘要】：电子束光刻技术(EBL)是一项新型的微细加工与分析技术。它是将微纳系统特征尺寸推向微细化的关键技术。由于EBL具有分辨率高、易于控制、加工精度高且能在不需昂贵掩膜的光刻胶上加工微结构等优点。使其成为微细加工技术研究的热点。精确的模拟三维微结构的加工工艺过程能有效的缩短研发周期,节约实验成本。本文围绕电子束光刻技术直接在光刻胶介质上加工三维微结构等问题。利用Monte Carlo方法建立能量沉积模型,求解工艺参数。然后利用元胞自动机与开发的混合算法模拟实验所得的微.结构。最后运用曝光剂量校正的方法提高微结构的分辨率。其中主要研究内容如下：1、基于电子束光刻技术的原理,建立电子散射模型,模拟电子与固体的相互作用。2、利用Monte Carlo方法建立能量沉积模型,求解电子束光刻加工工艺参数。并探究各工艺参数对能量沉积的影响。3、给定三维微结构的实验设计方案,控制不同的曝光剂量加工三维微结构。4、针对电子散射无规律及微结构模拟的复杂性的问题,本文提出元胞自动机与Monte Carlo混合算法,并利用该算法与元胞自动机算法模拟由实验获得的三维微结构。利用曝光剂量校正的方法提高微结构的分辨率。
[Abstract]:Electron beam lithography (EBL) is a new micromachining and analysis technique. It is the key technology to push the feature size of micro-nano system to micro-refinement. EBL has the advantages of high resolution, easy control, high machining accuracy and the ability to process microstructures on photoresist without expensive mask. It has become a hot spot in the research of micro-machining technology. Accurate simulation of three-dimensional micro-structure processing process can effectively shorten the research and development cycle and save the cost of experiment. In this paper, the electron beam lithography technology is used to fabricate three-dimensional microstructures directly on the photoresist medium. The energy deposition model is established by Monte Carlo method, and the process parameters are solved. Then we use cellular automata and the developed hybrid algorithm to simulate the experimental results. Structure. Finally, the resolution of microstructures is improved by using the method of exposure dose correction. The main research contents are as follows: 1. Based on the principle of electron beam lithography, the electron scattering model is established to simulate the interaction between electrons and solids. The energy deposition model is established by using Monte Carlo method to solve the process parameters of electron beam lithography. The effects of various technological parameters on energy deposition. 3. Given the experimental design scheme of three dimensional microstructures and controlling different exposure doses to process three dimensional microstructures, this paper aims at the irregularity of electron scattering and the complexity of the simulation of microstructures. In this paper, a hybrid algorithm of cellular automata and Monte Carlo is proposed, and the three-dimensional microstructure obtained from experiments is simulated by using the algorithm and the cellular automata algorithm. The resolution of microstructures is improved by the method of exposure dose correction.
【学位授予单位】：东南大学
【学位级别】：硕士
【学位授予年份】：2016
【分类号】：TN305.7

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