化学气相沉积法硅薄膜的制备及其性能

发布时间：2018-05-17 15:31

  本文选题：硅薄膜 + 防腐性　； 参考：《大连工业大学学报》2017年02期

【摘要】：运用化学气相沉积技术在不锈钢表面沉积了一层致密的硅薄膜,研究了沉积温度及硅烷气体压力对硅薄膜性能的影响。对沉积的硅薄膜进行了EDS能谱分析,通过SEM扫描电镜对硅薄膜微观形貌进行表征,并对沉积硅薄膜的不锈钢样品进行电化学分析,研究了硅薄膜对不锈钢抗腐蚀性能的影响。结果表明,化学气相沉积温度为390℃、硅烷气压为10kPa时金属表面形成的硅薄膜防腐性能最佳。
[Abstract]:A dense silicon film was deposited on the surface of stainless steel by chemical vapor deposition. The effects of deposition temperature and pressure of silane gas on the properties of silicon film were studied. The microstructure of silicon thin films was characterized by SEM scanning electron microscope (SEM). The effect of silicon films on corrosion resistance of stainless steel was studied by electrochemical analysis of stainless steel samples deposited by silicon thin films. The results show that when the chemical vapor deposition temperature is 390 鈩，

本文编号：1901888