步进—闪光式纳米压印模板之力学分析
发布时间：2018-08-24 16:36
【摘要】：随着数码和电子产品快速发展与换代,人们对于更强更快更便宜产品的需求也与日俱增。光刻技术是在硅片上构建半导体管以及电路的基础,是IC制造业中非常重要的一环,作为分辨率达到15 nm以下的光刻技术,压印被写入2013年国际半导体技术路线图(ITRS2013),步进闪光式纳米压印技术更是被认为是最有前途的光刻技术。本文就通过控制方程推导以及CFD软件仿真的方式对压印模型进行计算分析,课题的研究内容如下:首先,对特征模板为刚性模板的模型进行分析。先设定模型参数,建立模型,并判断压印胶的流动状态。考虑到极小间隙下压印胶的黏度以及表面张力,对压印胶的接触角以及压力突变进行分析。利用不可压缩粘性流体连续方程对压印胶模型进行分析,推导该模型下的控制方程。利用CFD软件FLOW-3D建立相关的模型并进行仿真计算,将仿真结果与理论推导的控制方程进行对比分析。对压印速度、压印胶黏度等参数进行分析比较,得到这些参数对于压印效率以及成本的影响和关系。然后,对特征模板为柔性模板的模型进行分析。柔性模板在压印技术中有很多优势,但是它在压印的时候会产生变形,那么就需要重新推导它的控制方程。在柔性模型中,对模板的弹性模量、厚度、压印胶黏度等参数选取不同的数值进行仿真分析,得到不同参数对于压印产生的效果,指导实际运用的选择。最后,针对传统的步进闪光式纳米压印技术进行优化,将传统的压印胶液滴给重新排列分布,利用小液滴可以减少压印时间以及更有利于特征图案填充的优势,将液滴均分为等体积小液滴,利用单元格方法对整个模型进行重新分析。小液滴模型的压印过程可以分为独立压印以及聚结压印两个阶段。对新模型进行仿真计算,得到新模型的压应力以及压印时间,对于压印效率以及压印成本进行再一次的分析比较。本文对步进闪光式纳米压印进行详细的分析和计算,分别针对刚性模板以及柔性模板下的模型,进行各个参数的比较分析,并对该技术进行压印胶改良排列,得到不同参数对于实际压印过程产生的不同影响,总结出可以减少成本以及提高效率的参数选择。本文对于步进闪光式纳米压印的工业化应用具有实际的指导意义,对纳米压印机的实际应用提供一定的参考价值。
[Abstract]:With the rapid development and replacement of digital and electronic products, the demand for stronger, faster and cheaper products is increasing. Photolithography is the basis for the construction of semiconductor transistors and circuits on silicon wafers. It is a very important link in the IC manufacturing industry and is used as a lithography technology with a resolution of less than 15 nm. Imprint is written into the International Semiconductor Technology Roadmap (ITRS2013) in 2013, and step flash nanoimprint is considered to be the most promising lithography technology. In this paper, the imprint model is calculated and analyzed by the derivation of control equation and the simulation of CFD software. The research contents are as follows: firstly, the model of feature template is analyzed as rigid template. First set up the model parameters, establish the model, and determine the imprint adhesive flow state. Considering the viscosity and surface tension of imprint adhesive under minimal clearance, the contact angle and pressure abrupt change of imprint adhesive are analyzed. The incompressible viscous fluid continuity equation is used to analyze the imprint adhesive model and the governing equation is derived. The related model is established by using CFD software FLOW-3D, and the simulation results are compared with the control equations derived from the theory. By analyzing and comparing the imprint speed and imprint adhesive viscosity, the influence and relationship of these parameters on imprint efficiency and cost are obtained. Then, the model of feature template as flexible template is analyzed. Flexible template has many advantages in imprint technology, but it will deform when it is imprinted, so it is necessary to rederive its governing equation. In the flexible model, different parameters such as modulus of elasticity, thickness and viscosity of embossing adhesive are selected for simulation analysis, and the effect of different parameters on imprint is obtained, which can guide the selection of practical application. Finally, the traditional step flash nano-imprint technology is optimized, the traditional imprint glue droplets are rearranged and distributed, and the small droplets can reduce the imprint time and the advantages of feature pattern filling. The droplets were divided into small droplets of equal volume and the whole model was reanalyzed by cell method. The imprint process of small droplet model can be divided into two stages: independent imprint and coalescence embossing. The new model is simulated and calculated, and the stress and imprint time of the new model are obtained, and the imprint efficiency and imprint cost are analyzed and compared again. In this paper, step flash nano-imprint is analyzed and calculated in detail. For the rigid template and the model under the flexible template, the parameters are compared and analyzed, and the technology is modified by imprint glue. The different effects of different parameters on the actual imprint process are obtained, and the selection of parameters which can reduce the cost and improve the efficiency is summarized. This paper has practical guiding significance for the industrial application of step flash nano-imprint, and provides certain reference value for the practical application of nano-imprint machine.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7;O342
[Abstract]:With the rapid development and replacement of digital and electronic products, the demand for stronger, faster and cheaper products is increasing. Photolithography is the basis for the construction of semiconductor transistors and circuits on silicon wafers. It is a very important link in the IC manufacturing industry and is used as a lithography technology with a resolution of less than 15 nm. Imprint is written into the International Semiconductor Technology Roadmap (ITRS2013) in 2013, and step flash nanoimprint is considered to be the most promising lithography technology. In this paper, the imprint model is calculated and analyzed by the derivation of control equation and the simulation of CFD software. The research contents are as follows: firstly, the model of feature template is analyzed as rigid template. First set up the model parameters, establish the model, and determine the imprint adhesive flow state. Considering the viscosity and surface tension of imprint adhesive under minimal clearance, the contact angle and pressure abrupt change of imprint adhesive are analyzed. The incompressible viscous fluid continuity equation is used to analyze the imprint adhesive model and the governing equation is derived. The related model is established by using CFD software FLOW-3D, and the simulation results are compared with the control equations derived from the theory. By analyzing and comparing the imprint speed and imprint adhesive viscosity, the influence and relationship of these parameters on imprint efficiency and cost are obtained. Then, the model of feature template as flexible template is analyzed. Flexible template has many advantages in imprint technology, but it will deform when it is imprinted, so it is necessary to rederive its governing equation. In the flexible model, different parameters such as modulus of elasticity, thickness and viscosity of embossing adhesive are selected for simulation analysis, and the effect of different parameters on imprint is obtained, which can guide the selection of practical application. Finally, the traditional step flash nano-imprint technology is optimized, the traditional imprint glue droplets are rearranged and distributed, and the small droplets can reduce the imprint time and the advantages of feature pattern filling. The droplets were divided into small droplets of equal volume and the whole model was reanalyzed by cell method. The imprint process of small droplet model can be divided into two stages: independent imprint and coalescence embossing. The new model is simulated and calculated, and the stress and imprint time of the new model are obtained, and the imprint efficiency and imprint cost are analyzed and compared again. In this paper, step flash nano-imprint is analyzed and calculated in detail. For the rigid template and the model under the flexible template, the parameters are compared and analyzed, and the technology is modified by imprint glue. The different effects of different parameters on the actual imprint process are obtained, and the selection of parameters which can reduce the cost and improve the efficiency is summarized. This paper has practical guiding significance for the industrial application of step flash nano-imprint, and provides certain reference value for the practical application of nano-imprint machine.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7;O342
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