浸没流场压力仿真与检测研究

发布时间：2018-10-11 17:53

【摘要】：浸没式光刻是超大规模集成电路制造的核心技术,它是在传统的光刻基础上在最后一层投影物镜以及硅片之间填充一层高折射率的液体,从而提高缝隙介质的折射率,提高曝光的最小分辨率以及焦深。浸没单元是浸没液体传送及控制的核心部件,并充当光路系统的一部分。曝光过程中的热量及光刻胶表面污染物的脱离泄露会污染浸没液体,从而影响最终的成像质量。目前主要通过浸没单元快速更新浸没液体从而带走污染物及热量。然而,在循环过程中,浸没流场的压力也会对最后一层投影物镜产生力的作用,造成投影物镜的变形、偏移等,并影响最终的曝光质量。因此有必要对浸没流场压力进行研究。本课题以专项大纲对浸没流场的压力指标为标准,以最后一层物镜下表面为受力面,通过数值仿真和实验检测的方式对流场压力进行研究,并完成以下工作:1.建立了浸没流场的动力学模型,对无扫描运动稳态工况、恒定最大扫描速度工况、以及几种典型的扫描路径工况下流场压力进行了仿真,得出流场压力的大致分布规律,并进行参数化仿真实验,通过数值仿真研究不同参数对流场压力的影响;2.设计浸没流场压力检测实验方案。在专项大纲给定的流场压力测试方案的基础上根据数值仿真的结果设计一套新的流场压力检测传感器布局方案。并通过Labview设计流场压力采集程序,采购相应实验设备并搭建实验平台进行调试。3.通过控制变量的方式,对不同流场参数,包括注液流量、垂直回收负压、水平回收负压、缝隙高度、以及扫描运动在内,对流场压力的影响进行了实验,并分析实验结果,验证仿真结果的可靠性,并找到这些参数对流场压力的影响规律,指导流场参数调节,从而保证流场压力在合理范围内。
[Abstract]:Immersion lithography is the core technology of VLSI manufacturing. It is based on traditional lithography and fills a layer of liquid with high refractive index between the last layer projection objective lens and silicon wafer, thus increasing the refractive index of slit medium. Increase the minimum resolution and depth of exposure. Immersion unit is the core component of submerged liquid transmission and control, and acts as part of the optical path system. The heat in the exposure process and the release of photoresist surface contaminants will contaminate the immersion liquid, which will affect the final imaging quality. At present, soaking liquid is rapidly updated by immersion unit to remove contaminants and heat. However, during the cycle, the pressure immersed in the flow field will also produce force on the last layer of the projective objective lens, resulting in the deformation and deviation of the projective objective lens, and affecting the final exposure quality. Therefore, it is necessary to study the pressure of submerged flow field. In this paper, the pressure index of submerged flow field is taken as the standard, the surface of the last objective lens is taken as the force surface, the flow field pressure is studied by numerical simulation and experimental detection, and the following work is accomplished: 1. The dynamic model of submerged flow field is established. The steady state condition of no scanning motion, the constant maximum scanning velocity condition and the flow field pressure under several typical scanning path conditions are simulated, and the general distribution law of the flow field pressure is obtained. Parametric simulation experiments are carried out to study the effect of different parameters on the flow field pressure through numerical simulation. 2. The experimental scheme of pressure detection in submerged flow field is designed. On the basis of the flow field pressure test scheme given in the special outline, a new sensor layout scheme for flow field pressure detection is designed according to the results of numerical simulation. And through Labview design flow field pressure acquisition program, procurement of corresponding experimental equipment and build experimental platform for debugging. 3. The effects of flow field parameters, including injection flow rate, vertical recovery negative pressure, horizontal recovery negative pressure, gap height, and scanning motion, on the flow field pressure were studied and the results were analyzed by means of controlling the variables, including the flow rate, the vertical recovery negative pressure, the horizontal recovery negative pressure, the gap height and the scanning motion. The reliability of the simulation results is verified and the influence law of these parameters on the flow field pressure is found to guide the flow field parameter adjustment so as to ensure that the flow field pressure is within a reasonable range.
【学位授予单位】：浙江大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TN305.7;O35

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