THz金属网格带通滤波器的研究
发布时间：2018-10-23 19:14
【摘要】：基于孔阵列的金属网格各单元之间相互耦合,金属中自由电子与入射电磁波发生共振,形成增强透射,共振波长由结构尺寸决定,因此基于孔阵列的金属网格结构常常作为带通滤波器。但金属网格在带外短波长区域存在旁瓣,严重影响滤波性能。旁瓣主要是由衍射、F-P共振和高阶共振三种因素造成的。本文设计了一种基于十字孔阵列结构的改进结构,来改善旁瓣问题。本论文主要工作包括以下两点。(1)设计了基于折叠十字孔阵列的金属网格带通滤波器。结合已有的相关理论,包括表面等离子激元理论、等效表面等离子激元、Wood异常、F-P腔原理、波导效应等,通过有限元仿真,发现短波区域旁瓣是由衍射、高阶共振峰、F-P共振峰组成,高阶共振的波长与主共振的波长是相对固定的,F-P共振峰的位置与网格厚度有关,衍射区域是波长小于周期的区域。折叠十字孔阵列主要是利用其紧凑的结构,使主共振峰与衍射区域尽量远离,实现在更大范围内良好的带外抑制。(2)对无基底金属网格带通滤波器的加工工艺进行研究。研究了其加工流程,并研制了二维周期结构的无掩模光刻系统,包括两个部分：1、设计并搭建了基于DMD投影成像的无掩模光刻系统的光路系统：2、研发了用于二维阵列扫描光刻的控制系统。采用SU-82010光刻胶和研制的光刻系统,按照相应流程,进行了光刻实验,然后通过电镀镍,成功制作了小规模阵列无基底金属网格结构。
[Abstract]:The metal mesh elements based on the aperture array are coupled with each other, and the free electron in the metal resonates with the incident electromagnetic wave, forming an enhanced transmission. The resonant wavelength is determined by the size of the structure. Therefore, metal mesh structures based on aperture arrays are often used as bandpass filters. However, the metal mesh has sidelobe in the short wavelength region outside the band, which seriously affects the filtering performance. The sidelobe is mainly caused by diffraction, F-P resonance and high order resonance. In this paper, an improved structure based on cross-hole array is designed to improve the sidelobe problem. The main work of this thesis is as follows: (1) A metal mesh bandpass filter based on folded cross hole array is designed. Combined with the existing theories, including surface plasmon theory, equivalent surface plasmon theory, Wood anomaly, F-P cavity principle, waveguide effect and so on, it is found that the short wave region sidelobe is diffracted by finite element simulation. The high order resonance peak, the F-P resonance peak, the high order resonance wavelength and the main resonance wavelength are relatively fixed, the position of the F-P resonance peak is related to the mesh thickness, and the diffraction region is the region where the wavelength is less than the period. The folded cross hole array mainly uses its compact structure to make the main resonance peak and diffraction region as far away as possible and to achieve better out-of-band suppression in a larger range. (2) the fabrication process of the substrate-free metal mesh bandpass filter is studied. The machining process is studied, and the mask free lithography system with two dimensional periodic structure is developed. There are two parts: 1. The optical path system of the mask free lithography system based on DMD projection imaging is designed and built. 2. A control system for two-dimensional array scanning lithography is developed. By using SU-82010 photoresist and the developed lithography system, lithography experiments were carried out according to the corresponding flow chart, and then the substrate free metal mesh structure of small scale array was successfully fabricated by electroplating nickel.
【学位授予单位】：东南大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN713.5
本文编号：2290224
[Abstract]:The metal mesh elements based on the aperture array are coupled with each other, and the free electron in the metal resonates with the incident electromagnetic wave, forming an enhanced transmission. The resonant wavelength is determined by the size of the structure. Therefore, metal mesh structures based on aperture arrays are often used as bandpass filters. However, the metal mesh has sidelobe in the short wavelength region outside the band, which seriously affects the filtering performance. The sidelobe is mainly caused by diffraction, F-P resonance and high order resonance. In this paper, an improved structure based on cross-hole array is designed to improve the sidelobe problem. The main work of this thesis is as follows: (1) A metal mesh bandpass filter based on folded cross hole array is designed. Combined with the existing theories, including surface plasmon theory, equivalent surface plasmon theory, Wood anomaly, F-P cavity principle, waveguide effect and so on, it is found that the short wave region sidelobe is diffracted by finite element simulation. The high order resonance peak, the F-P resonance peak, the high order resonance wavelength and the main resonance wavelength are relatively fixed, the position of the F-P resonance peak is related to the mesh thickness, and the diffraction region is the region where the wavelength is less than the period. The folded cross hole array mainly uses its compact structure to make the main resonance peak and diffraction region as far away as possible and to achieve better out-of-band suppression in a larger range. (2) the fabrication process of the substrate-free metal mesh bandpass filter is studied. The machining process is studied, and the mask free lithography system with two dimensional periodic structure is developed. There are two parts: 1. The optical path system of the mask free lithography system based on DMD projection imaging is designed and built. 2. A control system for two-dimensional array scanning lithography is developed. By using SU-82010 photoresist and the developed lithography system, lithography experiments were carried out according to the corresponding flow chart, and then the substrate free metal mesh structure of small scale array was successfully fabricated by electroplating nickel.
【学位授予单位】：东南大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN713.5
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