深紫外光刻投影物镜温度特性研究
发布时间：2018-10-29 19:15
【摘要】：透镜材料对激光能量的吸收导致深紫外光刻投影物镜温度升高,产生热像差。离轴照明模式下,温度呈非对称分布,研究温度场对热像差的仿真预测和补偿具有十分重要的意义。提出了温度分布函数模型描述4种照明模式下物镜的三维温度分布;研究了温度的时间特性,并通过计算预测了光刻物镜的热稳态温度值以及达到稳态所需的时间。结果表明,利用该温度分布模型描述多种常见照明模式下投影物镜的空间温度分布,平均拟合误差约为10-3℃量级;通过温度时间关系函数预测热稳态温度的误差约为10-4℃,时间误差不超过3min。通过该温度分布模型计算得到的热像差结果与基于SigFit的仿真结果一致,但计算效率提升了三个数量级。
[Abstract]:The absorption of laser energy by lens materials leads to the increase of temperature and thermal aberration of deep ultraviolet lithography projection lens. In off-axis illumination mode, the temperature distribution is asymmetric, so it is very important to study the simulation prediction and compensation of thermal aberration. The temperature distribution function model is proposed to describe the three-dimensional temperature distribution of the objective lens in four illumination modes, and the time characteristics of the temperature are studied, and the thermal steady-state temperature value of the lithographic objective lens and the time required to achieve the steady-state are calculated and predicted. The results show that the average fitting error is about 10 ~ (-3) 鈩，
本文编号：2298557
[Abstract]:The absorption of laser energy by lens materials leads to the increase of temperature and thermal aberration of deep ultraviolet lithography projection lens. In off-axis illumination mode, the temperature distribution is asymmetric, so it is very important to study the simulation prediction and compensation of thermal aberration. The temperature distribution function model is proposed to describe the three-dimensional temperature distribution of the objective lens in four illumination modes, and the time characteristics of the temperature are studied, and the thermal steady-state temperature value of the lithographic objective lens and the time required to achieve the steady-state are calculated and predicted. The results show that the average fitting error is about 10 ~ (-3) 鈩，
本文编号：2298557
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