接触型局域SP光刻直写头变形检测技术研究
发布时间：2018-11-23 12:37
【摘要】：光学光刻技术发展至今已有几十年的时间,并为“摩尔定律”的延续作出了重大贡献。但是光学光刻最终会因为达到技术极限或者是由于光刻成本剧增而被放弃。所以人们一直努力寻求能提高光刻分辨率,具有高效率、低成本的新方法和技术。其中,基于接触型表面等离子体光刻直写技术因其成本低廉、快捷灵活等特点,特别适合于小批、单件纳米图形制作需求,具有很好的开发价值。本课题来源于国家重点实验室开放基金“接触型局域SP光刻直写头设计和扫描性能分析研究”。根据课题要求,需要设计一种可行的检测方案对光刻直写过程中的直写头微变形情况进行检测,为进一步研究如何控制直写头的扫描姿态做准备。第二章首先介绍了直写头的结构及光刻直写过程,在课题组仿真分析的基础上,进一步研究了不同摩擦因数、位移载荷、扫描速度等外界因素对扫描模式下的直写头姿态偏转的影响。最后提出直写头姿态偏转角为具体的检测目标。第三章分别对电容法和光束偏转法两种检测思路进行了具体的可行性分析。特别是对基于光束偏转法直写头姿态偏转检测进行了数学模型建立和数值仿真分析,通过比较并选择了光束偏转法作为检测方案。第四章对已选择的方法进行了总体检测方案设计,然后分析并确定了光源、光电探测模块的种类。依据课题中对测量范围、测量分辨率的要求完成光路结构设计、He-Ne激光器的选择和光斑计算、PSD的参数计算和选型。第五章基于LabVIEW和数据采集卡USB6008,对PSD输出信号数据采集模块进行软件设计,编写了LabVIEW数据采集处理程序,用于后续的系统标定、稳定性、背景光影响等测试实验。最后简要介绍了搭建的实验平台,分析总结影响实验精度的几种因素,并提出了相应的改进措施。
[Abstract]:Optical lithography has been developed for decades and has contributed greatly to the continuation of Moore's Law. But optical lithography will eventually be abandoned because it reaches the technical limit or because of the soaring cost of lithography. So people have been looking for new methods and technologies that can improve lithography resolution and have high efficiency and low cost. Because of its low cost, high speed and flexibility, the direct writing technology based on contact surface plasma lithography is especially suitable for small batch, single piece nano-graphics production, and has a good development value. This paper is based on the National key Laboratory Open Fund, "Design of contact Local SP Lithography Direct Writing head and Analysis of scanning performance". According to the requirements of the project, we need to design a feasible detection scheme to detect the micro-deformation of the direct-writing head in the process of lithography, so as to prepare for further research on how to control the scanning attitude of the direct-writing head. In the second chapter, the structure of the direct-writing head and the process of lithography are introduced. On the basis of the simulation analysis of the research group, the different friction factors and displacement loads are further studied. The influence of external factors such as scanning speed on direct-write head posture deflection in scan mode. Finally, the pose deflection angle of direct writing head is proposed as the specific detection target. In chapter 3, the feasibility of capacitance method and beam deflection method are analyzed. In particular, the mathematical model and numerical simulation analysis of the direct-writing head attitude deflection detection based on the beam deflection method are carried out, and the beam deflection method is selected as the detection scheme through comparison. In the fourth chapter, the overall detection scheme is designed, and the light source and photoelectric detection module are analyzed and determined. According to the requirements of measurement range and resolution, the design of optical circuit structure, the selection of He-Ne laser and spot calculation, the calculation and selection of PSD parameters are completed. In the fifth chapter, based on LabVIEW and data acquisition card USB6008, the software design of PSD output signal data acquisition module is carried out, and the LabVIEW data acquisition and processing program is compiled for subsequent system calibration, stability and background light impact testing experiments. Finally, the experimental platform is introduced briefly, several factors influencing the precision of the experiment are analyzed and summarized, and the corresponding improvement measures are put forward.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
[Abstract]:Optical lithography has been developed for decades and has contributed greatly to the continuation of Moore's Law. But optical lithography will eventually be abandoned because it reaches the technical limit or because of the soaring cost of lithography. So people have been looking for new methods and technologies that can improve lithography resolution and have high efficiency and low cost. Because of its low cost, high speed and flexibility, the direct writing technology based on contact surface plasma lithography is especially suitable for small batch, single piece nano-graphics production, and has a good development value. This paper is based on the National key Laboratory Open Fund, "Design of contact Local SP Lithography Direct Writing head and Analysis of scanning performance". According to the requirements of the project, we need to design a feasible detection scheme to detect the micro-deformation of the direct-writing head in the process of lithography, so as to prepare for further research on how to control the scanning attitude of the direct-writing head. In the second chapter, the structure of the direct-writing head and the process of lithography are introduced. On the basis of the simulation analysis of the research group, the different friction factors and displacement loads are further studied. The influence of external factors such as scanning speed on direct-write head posture deflection in scan mode. Finally, the pose deflection angle of direct writing head is proposed as the specific detection target. In chapter 3, the feasibility of capacitance method and beam deflection method are analyzed. In particular, the mathematical model and numerical simulation analysis of the direct-writing head attitude deflection detection based on the beam deflection method are carried out, and the beam deflection method is selected as the detection scheme through comparison. In the fourth chapter, the overall detection scheme is designed, and the light source and photoelectric detection module are analyzed and determined. According to the requirements of measurement range and resolution, the design of optical circuit structure, the selection of He-Ne laser and spot calculation, the calculation and selection of PSD parameters are completed. In the fifth chapter, based on LabVIEW and data acquisition card USB6008, the software design of PSD output signal data acquisition module is carried out, and the LabVIEW data acquisition and processing program is compiled for subsequent system calibration, stability and background light impact testing experiments. Finally, the experimental platform is introduced briefly, several factors influencing the precision of the experiment are analyzed and summarized, and the corresponding improvement measures are put forward.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
【参考文献】
相关期刊论文 前2条
1 张攀峰;吴宇;刘晓e，
本文编号：2351643
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