非接触密封装置浸液注入控制分析
发布时间：2018-12-20 22:31
【摘要】：光刻机是超大规模集成电路制造的核心设备,浸没式光刻技术是一种基于传统的干式光刻设备的改造的光刻技术,业界普遍认可浸没式光刻技术作为半导体特征尺寸45nnl节点及以下的新一代的光刻技术,在半导体行业受到极大关注。浸没式光刻通过在镜头和硅片之间填充一层完整的浸没液体缝隙流场,从而改变了激光的光学折射介质。为了保证浸没液体稳定良好的光学性能和缝隙流场稳定快速的形成,这就要求浸没液体具有超高的纯度并能及时的得到更新,否则就会导致的曝光缺陷影响光刻成品率。当前浸没式光刻机均以超高纯度的超纯水作为理想的浸没液,采用浸液注入控制系统对制备出的超纯水进行流体动力学性能的调制,保证其能满足浸没液体缝隙流场的稳定快速的形成需求,同时不对超纯水产生污染。浸液注入控制系统中关于流体的流量控制效果将对缝隙流场的稳定形成有重要的影响。本文以对浸没式光刻机中使用到的浸液注入控制系统为研究对象,进行了浸液注入控制系统的设计和相关的控制分析,主要的工作包括以下几点。(1)分析了浸没式光刻机中使用到的浸液注入控制系统的工作需求,并依此设计了浸液注入控制系统的功能样机,包括原理设计,元器件选型,电气设计,控制柜加工设计,控制系统搭建等工作。(2)使用浸液注入控制系统功能样机完成了与超纯水制备系统以及非接触密封装置的联合调试实验。通过对调试实验过程中出现的问题的分析,进一步量化了浸液注入控制系统关于流量控制的相关指标,并指出了相关指标对缝隙流场形成状态的影响。(3)通过对浸液注入控制系统中流体控制单元的分析明确了纯时滞环节对于该流量控制方面造成的影响。同时采用理论以及仿真两种形式对如何消除纯滞后环节这种现象进行了相关的研究。在此基础上设计了一款模糊变增益Smith预估控制器使得我们能够使用Smtih预估器消除在控制过程中纯滞后环节的影响。(4)通过将设计的控制算法采用计算机语言实现并运用在浸液注入控制系统上做了四组实验,一方面验证了仿真分析的正确性,另一方面也使用实际数据证明了该种控制器在实际运用过程中具有的优点。并与超纯水制备设备及非接触密封装置联调证明了该种控制器对流量控制的积极作用及对缝隙流场形成的积极作用。
[Abstract]:Lithography machine is the core equipment of VLSI manufacturing. Immersion lithography technology is a kind of lithography technology based on the transformation of traditional dry lithography equipment. Immersion lithography technology is widely accepted as a new generation lithography technology for semiconductor feature size 45nnl nodes and below, which has attracted great attention in semiconductor industry. Immersion lithography changes the optical refraction medium of the laser by filling a layer of flow field between the lens and the silicon wafer with a complete submerged liquid slot. In order to ensure the stable optical properties of the submerged liquid and the stable and rapid formation of the slot flow field, it is required that the immersion liquid has ultra-high purity and can be updated in time, otherwise, the exposure defects will affect the yield of lithography products. At present, ultrapure water is used as ideal immersion solution in immersion lithography machine, and the hydrodynamic performance of the prepared ultrapure water is modulated by immersion injection control system. It can meet the demand of steady and fast formation of submerged liquid gap flow field and not pollute the ultra-pure water. The flow control effect of the fluid in the immersion injection control system will have an important effect on the steady formation of the slot flow field. In this paper, the design and analysis of the immersion injection control system used in immersion lithography are carried out. The main work includes the following points. (1) the working requirements of the immersion injection control system used in the immersion lithography are analyzed, and the functional prototype of the immersion injection control system is designed, including the principle design, the selection of components and devices. Electrical design, control cabinet processing design, control system construction and other work. (2) the use of immersion injection control system functional prototype to complete the ultra-pure water preparation system and non-contact sealing device joint debugging experiment. Through the analysis of the problems in the process of debugging experiment, the related indexes about flow control of the immersion injection control system are further quantified. The influence of relative indexes on the formation state of slot flow field is pointed out. (3) through the analysis of the fluid control unit in the immersion injection control system, the influence of pure time delay on the flow control is clarified. At the same time, theoretical and simulation methods are used to study how to eliminate the phenomenon of pure lag. On the basis of this, a fuzzy variable gain Smith predictor is designed, which enables us to use the Smtih predictor to eliminate the influence of pure delay in the control process. (4) the computer language is used to design the control algorithm. Four groups of experiments were carried out on the immersion injection control system. On the one hand, the correctness of the simulation analysis is verified; on the other hand, the advantages of the controller in practical application are proved by using the actual data. Combined with the ultra-pure water preparation equipment and the non-contact sealing device, the positive effect of the controller on the flow control and the formation of the slot flow field is proved.
【学位授予单位】：浙江大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
本文编号：2388522
[Abstract]:Lithography machine is the core equipment of VLSI manufacturing. Immersion lithography technology is a kind of lithography technology based on the transformation of traditional dry lithography equipment. Immersion lithography technology is widely accepted as a new generation lithography technology for semiconductor feature size 45nnl nodes and below, which has attracted great attention in semiconductor industry. Immersion lithography changes the optical refraction medium of the laser by filling a layer of flow field between the lens and the silicon wafer with a complete submerged liquid slot. In order to ensure the stable optical properties of the submerged liquid and the stable and rapid formation of the slot flow field, it is required that the immersion liquid has ultra-high purity and can be updated in time, otherwise, the exposure defects will affect the yield of lithography products. At present, ultrapure water is used as ideal immersion solution in immersion lithography machine, and the hydrodynamic performance of the prepared ultrapure water is modulated by immersion injection control system. It can meet the demand of steady and fast formation of submerged liquid gap flow field and not pollute the ultra-pure water. The flow control effect of the fluid in the immersion injection control system will have an important effect on the steady formation of the slot flow field. In this paper, the design and analysis of the immersion injection control system used in immersion lithography are carried out. The main work includes the following points. (1) the working requirements of the immersion injection control system used in the immersion lithography are analyzed, and the functional prototype of the immersion injection control system is designed, including the principle design, the selection of components and devices. Electrical design, control cabinet processing design, control system construction and other work. (2) the use of immersion injection control system functional prototype to complete the ultra-pure water preparation system and non-contact sealing device joint debugging experiment. Through the analysis of the problems in the process of debugging experiment, the related indexes about flow control of the immersion injection control system are further quantified. The influence of relative indexes on the formation state of slot flow field is pointed out. (3) through the analysis of the fluid control unit in the immersion injection control system, the influence of pure time delay on the flow control is clarified. At the same time, theoretical and simulation methods are used to study how to eliminate the phenomenon of pure lag. On the basis of this, a fuzzy variable gain Smith predictor is designed, which enables us to use the Smtih predictor to eliminate the influence of pure delay in the control process. (4) the computer language is used to design the control algorithm. Four groups of experiments were carried out on the immersion injection control system. On the one hand, the correctness of the simulation analysis is verified; on the other hand, the advantages of the controller in practical application are proved by using the actual data. Combined with the ultra-pure water preparation equipment and the non-contact sealing device, the positive effect of the controller on the flow control and the formation of the slot flow field is proved.
【学位授予单位】：浙江大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
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