超高NA光刻投影物镜高阶波像差检测方法

发布时间：2019-01-02 13:34

【摘要】：提出了一种基于八角度孤立空检测标记的超高NA光刻投影物镜高阶波像差检测方法。通过对八角度孤立空检测标记的空间像进行主成分分析(PCA)和多元线性回归分析,构建了超高NA光刻投影物镜的空间像光强分布与高阶波像差之间的线性模型,并基于该模型实现了高阶波像差的检测。与使用六角度孤立空检测标记的传统方法相比,本方法提高了光瞳面波前的采样效率,拓展了波像差检测范围,实现了超高NA光刻投影物镜高阶波像差(Z_5~Z_(64))的高精度检测。光刻仿真软件PROLITH的仿真结果表明,该方法可实现60项泽尼克系数(Z_5~Z_(64))的检测,检测精度优于1.03×10~(-3)λ。
[Abstract]:A high order wave aberration detection method for ultra-high NA lithographic projection objective lens based on eight angle solitary space detection markers is proposed. Based on principal component analysis (PCA) and multivariate linear regression analysis, a linear model between spatial intensity distribution and higher-order wavefront aberration of ultra-high NA lithographic projection objective lens is constructed by using principal component analysis (PCA) and multivariate linear regression analysis. Based on this model, high order aberration detection is realized. Compared with the traditional method using six-angle solitary space detection, this method improves the sampling efficiency of pupil wavefront and extends the range of wave aberration detection. The high order wavefront aberration (Z5s) of ultra-high NA lithographic projection objective lens is detected with high precision. The simulation results of lithography simulation software PROLITH show that the method can detect 60 Zs _ (5) Z _ (64), and the detection accuracy is better than 1.03 脳 10 ~ (-3) 位.
【作者单位】：中国科学院上海光学精密机械研究所信息光学与光电技术实验室;中国科学院大学;上海微电子装备有限公司;
【基金】：国家自然科学基金(61275207,61405210,61474129)
【分类号】：TN405

【相似文献】