光栅—金属电介质复合结构的超分辨SPs光刻特性研究

发布时间：2019-01-27 07:04

【摘要】：超衍射极限的光刻技术已经成为世界范围内纳米科技和微电子工业发展迫切的技术需求。表面等离子体(Surface plasmon polaritons, SPs)具有近场局域增强和波长远小于激发波长等特性,为突破光学衍射极限的高分辨光刻技术提供了一种新的方法。金属-电介质多层复合结构是纳米尺度的金属层和介质层通过多层复合构成的一种具有新颖光学特性的光学材料(Metamaterials),可以作为高空间频率、局域增强的表面等离子体波(SPW)耦合传递的有效载体,实现高频电磁波能量在结构内的耦合传递,并可在结构的出射端获得空间高度局域的超衍射极限光场分布,进而可以用于超小尺度的近场光刻。本文基于表面等离子体的干涉效应,采用理论分析与数值仿真相结合的方式详细研究了光栅Ag/SiO2多层薄膜复合结构的表面等离子体光刻特性。针对405nm波长的普通紫外光源,利用等效介质理论、传输矩阵理论系统地研究了Ag/SiO2多层结构的色散及空间滤波特性,并对结构参数进行了优化设计。利用优化参数,在405nm波长的TM偏振光照明下,数值上获得了横向空间分辨率为19.7nm的超衍射极限光刻条纹。在此基础上,针对一直困扰表面等离子体光刻的条纹陡直度和对比度较差的技术问题,我们利用表面等离子体微腔共振的原理,提出并设计了一种Ag/SiO2多层复合结构的SPs谐振腔光刻结构。利用微腔间SPs的强烈垂直耦合效应,使得腔内光刻区域中局域场得到显著地纵向延伸与增强,获得了对比度接近于1的光刻条纹且其刻蚀深度得以显著提升。上述研究成果将在纳米尺度半导体器件的加工、制备和集成,超衍射极限成像及传感等领域具有重要的应用价值。
[Abstract]:Ultra-diffractive lithography has become an urgent technical requirement for the development of nanotechnology and microelectronics industry around the world. Surface plasma (Surface plasmon polaritons, SPs) has the characteristics of near-field local enhancement and wavelength much smaller than the excitation wavelength, which provides a new method for high-resolution lithography to break through the limit of optical diffraction. The metal-dielectric multilayer composite structure is a novel optical material, (Metamaterials), which is composed of nanoscale metal layer and dielectric layer through multilayer composite, and can be used as high spatial frequency. The effective carrier of (SPW) coupling transfer of locally enhanced surface plasma wave can realize the coupling transfer of high frequency electromagnetic wave energy in the structure, and the spatial distribution of the highly localized superdiffraction limit light field can be obtained at the exit end of the structure. Then it can be used in near field lithography on a very small scale. Based on the interference effect of surface plasma, the surface plasma lithography characteristics of Ag/SiO2 multilayer composite structure are studied in detail by theoretical analysis and numerical simulation. Based on the equivalent medium theory and the transfer matrix theory, the dispersion and spatial filtering characteristics of 405nm multilayer structure are systematically studied, and the structural parameters are optimized. Using the optimized parameters, the super-diffractive limiting lithographic fringes with a transverse spatial resolution of 19.7nm are obtained numerically under the TM polarized illumination at 405nm wavelength. On this basis, we use the principle of surface plasmon microcavity resonance to solve the technical problem of low stripe steepness and low contrast, which has been puzzling the surface plasma lithography all the time. A SPs resonator photolithography structure with Ag/SiO2 multilayer composite structure is proposed and designed. By using the strong vertical coupling effect of SPs between microcavities, the local field in the lithography region of the cavity is significantly lengthwise extended and enhanced, and the lithographic stripes with a contrast close to 1 are obtained and the etching depth is significantly increased. These results will be of great value in the fabrication, fabrication and integration of nanoscale semiconductor devices, as well as in the field of super-diffraction limit imaging and sensing.
【学位授予单位】：合肥工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7

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