组合倍率极紫外光刻物镜梯度膜设计
发布时间：2019-05-06 07:57
【摘要】：10nm以下光刻技术牵引极紫外(EUV)光刻物镜向超高数值孔径(NA)、组合倍率设计形式发展,物镜系统的入射角和入射角范围因此急剧增大,传统规整膜和横向梯度膜难以满足该类物镜系统反射率及像质要求。为此,提出了横纵梯度膜组合法,用横向梯度膜提高反射率,用纵向梯度膜提高反射率均匀性,并补偿横向梯度膜引入的像差。应用该方法对一套NA为0.50的组合倍率EUV光刻物镜进行膜层设计,设计结果表明,在保证系统成像性能不变的情况下,平均每面反射镜的反射率大于60%,各反射镜的反射峰谷值均小于3.5%,满足光刻要求,验证了横纵梯度膜组合法的可行性。
[Abstract]:Under the 10nm lithography technology, the ultra-ultraviolet (EUV) lithography object lens is developed to the ultra-high numerical aperture (NA), combination design form, so the incidence angle and the range of incident angle of the objective lens system increase dramatically. It is difficult to meet the reflectivity and image quality requirements of this kind of objective system by conventional regular film and transverse gradient film. The transverse gradient film is used to improve the reflectivity, the longitudinal gradient film is used to improve the reflectivity uniformity, and the aberration introduced by the transverse gradient film is compensated. The method is used to design a set of composite EUV lithography objective lens with NA 0.50. The design results show that the reflectivity of each reflector is more than 60% under the condition that the imaging performance of the system is not changed, and the reflectivity of each reflector is more than 60%. The reflection peak and valley values of each mirror are less than 3.5%, which meet the requirements of lithography. The feasibility of the cross-longitudinal gradient film combination method is verified.
【作者单位】： 北京理工大学光电学院光电成像技术与系统教育部重点实验室;
【基金】：国家科技重大专项 国家自然科学基金面上项目(61675026);国家自然科学基金重大科研仪器研制项目(11627808)
【分类号】：TN23
，
本文编号：2470011
[Abstract]:Under the 10nm lithography technology, the ultra-ultraviolet (EUV) lithography object lens is developed to the ultra-high numerical aperture (NA), combination design form, so the incidence angle and the range of incident angle of the objective lens system increase dramatically. It is difficult to meet the reflectivity and image quality requirements of this kind of objective system by conventional regular film and transverse gradient film. The transverse gradient film is used to improve the reflectivity, the longitudinal gradient film is used to improve the reflectivity uniformity, and the aberration introduced by the transverse gradient film is compensated. The method is used to design a set of composite EUV lithography objective lens with NA 0.50. The design results show that the reflectivity of each reflector is more than 60% under the condition that the imaging performance of the system is not changed, and the reflectivity of each reflector is more than 60%. The reflection peak and valley values of each mirror are less than 3.5%, which meet the requirements of lithography. The feasibility of the cross-longitudinal gradient film combination method is verified.
【作者单位】： 北京理工大学光电学院光电成像技术与系统教育部重点实验室;
【基金】：国家科技重大专项 国家自然科学基金面上项目(61675026);国家自然科学基金重大科研仪器研制项目(11627808)
【分类号】：TN23
，
本文编号：2470011
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