氧等离子体刻蚀对石墨烯的力学和电学性能影响研究

发布时间：2018-04-05 02:32

本文选题：石墨烯　切入点：氧等离子　出处：《南京航空航天大学》2017年硕士论文

【摘要】：石墨烯是一种以碳原子以SP2杂化方式构成的的二维材料,它的结构是一种二维的六角形结构,氧等离子体蚀刻已经在石墨烯改性和带隙改变方面有所应用,是一种很好的石墨烯改性的方式,在最近的几年的研究中也逐渐变成了热门的话题。在氧等离子刻蚀石墨烯的过程中,石墨烯会无差别的收到氧等离子的轰击。等离子体处理,尤其是氧等离子体处理,因为很高的化学反应活性,已经成为了一个很好的改变碳基材料纳米结构和其性质的方式。在本项研究中,我们将研究由化学沉积生长(CVD)后转移到Si/Si O2基底上的多层石墨烯,在经过氧等离子不同时间的刻蚀以后,刻蚀对其结构,性能的影响。经历过10秒,30秒,60秒和180秒不同时间的刻蚀以后,我们使用原子力显微镜来表征样品的形貌和缺陷和研究样品的力学特性的变化。通过使用静电力显微镜和铁电分析仪分析对比不同刻蚀时间的样品,我们讨论了氧等离子体刻蚀对其电学性能的影响。通过实验,主要研究了氧等离子刻蚀对石墨烯的结构、形貌、力学性能、电学性能的影响,并分析了刻蚀的主要机制,所得结论与发现对于石墨烯改性和等离子刻蚀机制研究具有一定的学术和应用价值。
[Abstract]:Graphene is a two-dimensional material composed of carbon atom and SP2 hybrid. Its structure is a two-dimensional hexagonal structure. Oxygen plasma etching has been used in graphene modification and band gap change.It is a good way to modify graphene and has become a hot topic in recent years.In the process of oxygen plasma etching graphene, graphene will receive oxygen plasma bombardment without distinction.Plasma treatment, especially oxygen plasma treatment, because of its high chemical reaction activity, has become a good way to change the nanostructures and properties of carbon-based materials.In this study, we will study the effect of etching on the structure and properties of Si/Si O 2 substrate after etching by oxygen plasma at different time after the multilayer graphene is transferred to the substrate of Si/Si O 2 by chemical deposition.After etching for 10 seconds, 30 seconds, 60 seconds and 180 seconds, atomic force microscopy was used to characterize the morphology and defects of the samples and to study the changes of the mechanical properties of the samples.The effects of oxygen plasma etching on the electrical properties of samples with different etching times were analyzed and compared by using a hydrostatic microscope and a ferroelectric analyzer.The effects of oxygen plasma etching on the structure, morphology, mechanical properties and electrical properties of graphene were studied, and the main mechanism of etching was analyzed.The conclusions and findings are of academic and practical value for the study of graphene modification and plasma etching mechanism.
【学位授予单位】：南京航空航天大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：O613.71

【参考文献】