金属修饰氮掺杂二氧化钛薄膜的制备与光催化氧化性能研究

发布时间：2018-05-13 11:23

本文选题：磁控溅射 + 二氧化钛薄膜　；参考：《东南大学》2016年硕士论文

【摘要】：二氧化钛是目前研究最广泛的半导体光催化材料之一,具有催化活性高、价廉、耐腐蚀性强等特点,已被广泛应用于光解水制氢、抗菌除臭、废气净化、降解有机物、自清洁等方面。但由于其禁带宽度较宽,量子效率也较低,限制了二氧化钛的大面积应用。本文通过金属修饰与N掺杂的协同作用,对Ti02薄膜进行改性,以使其获得更高的光催化氧化性能。采用磁控溅射法制备了Fe修饰N掺杂Ti02薄膜(Fe-N-TiO2),研究了Fe修饰量与热处理对薄膜结构、形貌、表面元素化学态以及光吸收性能的影响。结果表明：Fe修饰N掺杂使薄膜晶粒细化,比表面积增大；Fe含量的增加有助于晶粒长大；且有助于金红石相向锐钛矿相转变,Fe含量为1.5 at.%时,薄膜为纯锐钛矿相；Fe元素是以Fe3+氧化态形式替位存在于TiO2晶格中,N-取代O2-进入晶格中；随着Fe含量的增加吸收边红移程度增大,当Fe含量达到3.0 at.%时,吸收边红移至近410nm；对薄膜进行退火处理后,薄膜的结晶性变好,吸收边有一定程度的红移。采用磁控溅射法制备了Ni修饰N掺杂Ti02薄膜(Ni-N-TiO2),研究了Ni修饰量对薄膜结构、形貌和性能的影响。Ni修饰N掺杂使薄膜晶粒细化,比表面积增大；且使薄膜中金红石相转化为锐钛矿相,Ni含量为0.7 at.%时,薄膜为纯锐钛矿相；Ni元素是以Ni2+氧化态形式间位存在于Ti02晶格中；随着Ni含量的增加吸收边红移程度增大,当Ni含量达到4.8 at.%时,吸收边红移至近450nm。Fe修饰N掺杂Ti02薄膜的可见光催化氧化活性顺序为：1.5 at.%Fe-N-TiO21.0 at.%Fe-N-TiO2N-TiO23.0 at.%Fe-N-TiO2TiO2,2h后最高可降解罗丹明B48.2%。Ni修饰N掺杂Ti02薄膜的可见光催化氧化活性顺序为：0.7 at.%Ni-N-TiO20.8 at.%Ni-N-TiO2N-TiO24.8 at.%Ni-N-TiO2TiO2,2h后最高可降解罗丹明B45.9%。
[Abstract]:TiO _ 2 is one of the most widely used semiconductor photocatalysis materials . It has the characteristics of high catalytic activity , low cost , strong corrosion resistance , etc . It has been widely used in the fields of hydrogen production , antibiosis , deodorization , waste gas purification , degradation of organic matter and self - cleaning .
The increase of Fe content contributes to grain growth .
and the film is a pure anatase phase when the Fe content is 1.5 at . % .
The Fe element is in the form of Fe3 + oxidation state in the TiO2 crystal lattice , and the N - substituted O2 - enters the lattice ;
With the increase of Fe content , the absorption edge redshift increased , while Fe content reached 3.0 at . % , the absorption edge red moved to near 410nm .
Ni - modified N - doped Ti02 thin films ( Ni - N - TiO2 ) were prepared by magnetron sputtering . The effect of Ni modification on the structure , morphology and properties of thin films was studied .
and the rutile phase in the film is converted into an anatase phase , and the Ni content is 0.7 at . % , and the thin film is a pure anatase phase ;
The Ni element is present in the crystal lattice of Ti02 in the form of Ni 2 + oxidation state ;
The visible light catalytic oxidation activity sequence of Fe - modified N - doped Ti02 thin films was : 1.5 at . % Fe - N - TiO31.0 at . % Fe - N - TiO31.0 at . % Fe - N - TiO31.0 at . % Fe - N - TiO20 . 0 at . % Ni - N - TiO20.8 at . % Ni - N - TiO24 . 8 at . % Ni - N - TiO2TiO2 , and the highest degradable rhodamine B 45.9 % after 2h .

【学位授予单位】：东南大学
【学位级别】：硕士
【学位授予年份】：2016
【分类号】：TQ134.11;O643.36

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