掩模台机械系统设计及仿真

发布时间：2019-03-08 11:37

【摘要】：光刻机是集成电路产业的基础设备,光刻机的线宽决定着集成电路的特征尺寸。光刻机研制水平的提高能够带动整个集成电路产业界的技术升级,能够有效地促进国家经济的发展和提高国家高技术领域的核心竞争力。光刻机俨然已成为衡量国家综合国力的重要标志。极紫外光刻机是当今光刻机研制中的热点。掩模台是极紫外光刻机中的核心组成部分,由于极紫外光刻机套刻精度和产业化的要求,掩模台要实现高速大行程的纳米级运动,这使得掩模台成为了一个电、气、磁耦合的复杂机械系统。利用SolidWorks、ANSYS静力分析、ANSYS模态分析和ANSYS拓扑优化初步完成了对掩模台的结构设计和优化,使其固有频率和质量都能达到设计要求。掩模台设计成宏动台和微动台的双级结构。宏动台采用“H”型直线电机驱动和气浮导轨支撑,微动台采用音圈电机驱动和支撑。直线电机的启动和停止会引起掩模台的超调,因此对微动台、掩模支撑系统、基座系统分别进行了瞬态分析,得到了相应的稳定时间。直线电机的电磁力存在周期性的波动,这个波动会影响宏动台的振动。利用ANSYS谐分析得到了掩模支撑系统的最大振动幅值。为了得到外界干扰的影响,对基座系统进行了随机振动分析。利用SolidWorks、GAMBIT和FLUENT完成了对气浮导轨的设计,使得每个气浮滑块竖直刚度为93.46 N/μm,水平刚度为121.56 N/μm。掩模板的变形会直接影响到套刻精度,因此对掩模板进行了热-结构耦合分析。当掩模板变形产生的套刻误差超出设计指标值时,提出了三条改进措施,最终使其达到设计指标。
[Abstract]:Lithography machine is the basic equipment of the integrated circuit industry. The linewidth of the lithography machine determines the characteristic size of the integrated circuit. The improvement of the development level of the lithography machine can promote the technology upgrade of the whole integrated circuit industry, promote the development of the national economy and improve the core competitiveness of the national high-tech field effectively. Lithography machine has become an important symbol of national comprehensive national strength. The ultra-violet lithography machine is a hot spot in the research and development of the lithography machine today. The mask table is the core component of the ultra-ultraviolet lithography machine. Because of the precision and industrialization requirements of the ultra-ultraviolet lithography machine, the mask table must realize the high-speed and large-stroke nanoscale movement, which makes the mask table become an electric and gas. Magnetically coupled complex mechanical systems. By using the static analysis of SolidWorks,ANSYS, ANSYS modal analysis and ANSYS topology optimization, the structure design and optimization of the mask table are preliminarily completed, so that the natural frequency and quality of the mask can meet the design requirements. The mask table is designed as a two-stage structure of macro-moving platform and micro-moving table. The macro platform is driven by H-type linear motor and supported by air-floating guideway, while the micro-platform is driven and supported by voice coil motor. The start and stop of the linear motor will cause the overshoot of the mask table. Therefore, the transient analysis of the micro-platform, the mask support system and the base system is carried out, and the corresponding stability time is obtained. The electromagnetic force of linear motor fluctuates periodically, which will affect the vibration of macroplatform. The maximum vibration amplitude of mask support system is obtained by ANSYS harmonic analysis. In order to obtain the influence of external interference, the random vibration analysis of the base system is carried out. By using SolidWorks,GAMBIT and FLUENT, the design of the air-bearing guideway is completed. The vertical stiffness and horizontal stiffness of each air-floating slide block are 93.46 N / 渭 m and 121.56 N / 渭 m respectively. The deformation of the mask will directly affect the accuracy of the mask, so the thermal-structural coupling analysis of the mask is carried out. When the cover error caused by the deformation of mask template exceeds the design index value, three improvement measures are put forward to make it reach the design target at last.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2011
【分类号】：TH122

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