L0周边Mura分析及其改善研究

发布时间：2018-02-15 23:56

  本文关键词： L周边Mura 液晶屏 盒厚 辅助封框胶　出处：《液晶与显示》2014年05期 　论文类型：期刊论文

【摘要】：L0周边Mura是TFT-LCD的一种常见缺陷。本文对L0周边Mura发生原因进行分析,发现真空对盒工艺进行过程中玻璃基板表面受力不均使力学合成力较少的局部位置发生形变并引起液晶屏周边区域盒厚波动,产生不良。采用辅助封框胶开环方式,主封框胶内外两侧压差趋于平衡,L0周边Mura发生率大幅降低;而通过优化辅助封框胶工艺有效地解决了周边区域力学失衡难题,不良发生率降至0.3%,改善效果明显。此外,周边优化设计方案有助于新产品开发阶段避免该不良发生。
[Abstract]:L0 peripheral Mura is a common defect of TFT-LCD. The cause of L0 peripheral Mura is analyzed in this paper. It is found that the uneven force on the surface of the glass substrate during the process of vacuum processing causes the deformation of the local position with less mechanical synthesis force and the fluctuation of the box thickness around the liquid crystal screen. The incidence of L0 peripheral Mura was reduced significantly by the pressure difference between the inner and outer sides of the main sealing frame adhesive, and the mechanical imbalance problem of the surrounding area was effectively solved by optimizing the auxiliary sealing frame adhesive process, and the bad incidence rate was reduced to 0.3, and the improvement effect was obvious. The peripheral optimum design scheme is helpful to avoid this bad situation in the new product development stage.
【作者单位】： 北京京东方显示技术有限公司CELLPI部;
【基金】：北京市优秀人才培养基金(No.2011D001146000002)
【分类号】：TN873.93
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本文编号：1514178