接近式光刻对准中的叠栅干涉测角方法

发布时间：2018-02-28 15:09

本文关键词： 测量干涉测量叠栅技术微细加工光刻　出处：《中国激光》2014年12期 　论文类型：期刊论文

【摘要】：干涉测量是众多科学与工程领域广泛采用的精密计量手段。探索了一种方便可控的基于双光栅衍射的叠栅干涉相敏测角方法,可直接用于接近式光刻过程中掩模衬底的倾斜矫正及面内角调节,便于微纳米器件及微光电子系统集成等相关应用。本方法旨在分别利用双光栅多次衍射产生的对称与相似级次,实现(m,-m)级叠栅干涉与(m,0)级叠栅干涉,产生相位与二者相对倾斜角、面内角有关的场分布。分析推导了叠栅干涉测角的基本原理,然后介绍相应的(m,-m)级与(m,0)级干涉测角方案设计。具体而言,二者均类似地根据条纹偏转及频率变化分别以离轴与同轴的方式监测倾斜及面内偏转角度。设计相应的组合光栅标记进行实验验证。实验结果及分析表明,倾斜角与面内角的调节精度分别可达10-3 rad及10-4 rad。
[Abstract]:Interferometric measurement is widely used in many fields of science and engineering. A convenient and controllable method based on double grating diffraction for phase sensitive angle measurement with stacked grating interferometry is explored. It can be used directly in the process of close lithography to correct the tilt of the mask substrate and adjust the angle inside the face. The purpose of this method is to use the symmetry and similarity order produced by the double grating multiple diffraction to realize the laminated grating interference and the laminated grating interference at the same time, which is convenient for the integration of micro and nano devices and micro optoelectronic systems. The field distribution related to the phase and the relative inclination angle and the angle inside the plane is produced. The basic principle of the interference angle measurement of the superimposed grating is analyzed and deduced, and the corresponding scheme design of the interference angle measurement of the two levels is introduced. The angle of tilt and in-plane deflection are monitored by off-axis and coaxial, respectively according to the fringe deflection and frequency change. The corresponding combined grating marks are designed for experimental verification. The experimental results and analysis show that, The adjusting accuracy of inclination angle and inplane angle can reach 10 ~ (-3) rad and 10 ~ (-4) rad. respectively.
【作者单位】：许昌职业技术学院机电工程系;中国科学院光电技术研究所;
【基金】：国家自然科学基金(61376110,61274108)
【分类号】：TH744.3

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