雕塑薄膜的镀制及其特性研究
发布时间：2019-06-19 02:10
【摘要】：随着薄膜被越来越广泛的使用,人们对薄膜的性能与功能提出了新的要求,对薄膜的研究工作也在随着这些要求的不断出现而日趋深化。雕塑薄膜由于它的微观可控性,使得它拥有广阔的运用前景。 本文先从普通薄膜生长理论出发,分析薄膜的微观结构,说明雕塑薄膜生长时与常规薄膜的不同之处,从而分析雕塑薄膜的微观结构及其成因。将雕塑薄膜类比于光学晶体材料,并考虑雕塑薄膜的特殊性,建立适用于雕塑薄膜的等效折射率模型,推导出适合计算单层雕塑薄膜光学常数的公式。在普鲁泰镀膜机上,分别以65°、70°、75°、80°、85°的沉积角镀制Ti02和Si02薄膜,通过光谱分析,得出不同的工艺参数对这些薄膜的折射率和厚度的影响。用椭偏仪分析雕塑薄膜的各向异性,并通过建模拟合,表征雕塑薄膜的微观结构。用椭偏测量结果检验前面建立起的等效折射率模型,分析结果,并指出本课题实验结果不足之处,对雕塑薄膜的前景进行展望。
[Abstract]:With the more and more extensive use of thin films, people put forward new requirements for the properties and functions of thin films, and the research work on thin films is deepening with the continuous emergence of these requirements. Because of its microcosmic controllability, sculpture film has a broad application prospect. In this paper, based on the theory of ordinary thin film growth, the microstructure of sculpture film is analyzed, and the difference between sculpture film growth and conventional film growth is explained, so as to analyze the microstructure and cause of formation of sculpture film. The sculpture film is compared to the optical crystal material, and considering the particularity of the sculpture film, the equivalent refractive index model suitable for the sculpture film is established, and the formula suitable for calculating the optical constant of the single layer sculpture film is derived. Ti02 and Si02 thin films were deposited at 65 掳, 70 掳, 75 掳, 80 掳and 85 掳deposition angles on Prutai coating machine. the effects of different process parameters on the refractive index and thickness of these films were obtained by spectral analysis. The anisotropy of sculpture film was analyzed by ellipsometer, and the microstructure of sculpture film was characterized by simulation. The equivalent refractive index model established earlier is tested by ellipsometric measurement results, the results are analyzed, and the shortcomings of the experimental results in this subject are pointed out, and the prospect of sculptural thin films is prospected.
【学位授予单位】：南京理工大学
【学位级别】：硕士
【学位授予年份】：2013
【分类号】：O484.1
本文编号：2501984
[Abstract]:With the more and more extensive use of thin films, people put forward new requirements for the properties and functions of thin films, and the research work on thin films is deepening with the continuous emergence of these requirements. Because of its microcosmic controllability, sculpture film has a broad application prospect. In this paper, based on the theory of ordinary thin film growth, the microstructure of sculpture film is analyzed, and the difference between sculpture film growth and conventional film growth is explained, so as to analyze the microstructure and cause of formation of sculpture film. The sculpture film is compared to the optical crystal material, and considering the particularity of the sculpture film, the equivalent refractive index model suitable for the sculpture film is established, and the formula suitable for calculating the optical constant of the single layer sculpture film is derived. Ti02 and Si02 thin films were deposited at 65 掳, 70 掳, 75 掳, 80 掳and 85 掳deposition angles on Prutai coating machine. the effects of different process parameters on the refractive index and thickness of these films were obtained by spectral analysis. The anisotropy of sculpture film was analyzed by ellipsometer, and the microstructure of sculpture film was characterized by simulation. The equivalent refractive index model established earlier is tested by ellipsometric measurement results, the results are analyzed, and the shortcomings of the experimental results in this subject are pointed out, and the prospect of sculptural thin films is prospected.
【学位授予单位】：南京理工大学
【学位级别】：硕士
【学位授予年份】：2013
【分类号】：O484.1
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