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铁基非晶合金薄膜的热处理和电子束辐照工艺及磁性能研究

发布时间:2018-01-17 00:14

  本文关键词:铁基非晶合金薄膜的热处理和电子束辐照工艺及磁性能研究 出处:《深圳大学》2017年硕士论文 论文类型:学位论文


  更多相关文章: 脉冲激光沉积 非晶合金薄膜 退火 电子束辐照


【摘要】:软磁性薄膜材料在电子信息技术高速发展的今天有着重要的地位。然而采用先进的脉冲激光沉积技术制备的非晶合金薄膜具有比相同成分的条带非晶样品更差的磁学性能。本文采用了脉冲激光沉积技术,在Si(100)单晶衬底上制备了Fe-B-Si-Nb的非晶合金薄膜,利用扫描电子显微镜(SEM)分析薄膜样品的表面形貌和厚度,利用X射线衍射仪(XRD)来分析薄膜的结构,采用原子力显微镜(AFM)来分析薄膜样品的表面形貌和粗糙度变化,使用综合物性分析仪(PPMS)中的VSM组件来对薄膜的磁性能进行测试分析,探讨了脉冲激光沉积时沉积参数、热处理和电子束辐照改性对Fe基非晶合金薄膜结构以及磁性能的影响。取得的主要研究结果如下:(1)对于在室温条件下沉积的Fe基薄膜,薄膜均为非晶态结构,通过台阶高度的测量分析发现薄膜的沉积速率随着膜厚的增加逐渐变缓。薄膜的粗糙度会随着厚度的增加而增加,薄膜的矫顽力随着厚度的增加而变大。(2)衬底温度的升高会导致薄膜的质量下降,薄膜表面出现许多孔洞,并且孔洞大小随着沉积温度的升高而增加,薄膜的粗糙度也随温度而增加,薄膜的矫顽力随着沉积温度的升高会先下降后升高,直至软磁性能恶化。(3)Fe基非晶合金薄膜在500℃退火保温1h后,在XRD图像上出现了结晶相α-Fe和Fe3Si,晶粒大小分别为34nm和30nm,薄膜的粗糙度随着退火温度的升高而增加,在退火温度为300℃时薄膜的矫顽力最低,此时薄膜的矫顽力相比于原始未退火的薄膜下降了43%。(4)在300℃退火保温不同时间,保温时间的延长会使得薄膜的粗糙度增加,但是薄膜还是非晶的状态,薄膜的矫顽力会随着保温时间的增加呈现出先下降后升高的趋势,在300℃退火保温0.5h时的薄膜其矫顽力最小,相比原始态薄膜下降了73%。(5)经过电子束辐照后的薄膜表面出现许多花斑状的结构,数量会随着辐照剂量的升高而增加,经过辐照后的薄膜还是非晶的状态,薄膜的矫顽力会随着辐照剂量的增加而下降,当电子束辐照剂量为40k Gy时,此时薄膜的矫顽力最低,为5.4Oe,薄膜的矫顽力相对于原始薄膜相比降低了89%。(6)通过退火和电子束辐照两种手段进行对比发现电子束辐照改性的方法比传统退火的方法改性更为有效地降低了薄膜的矫顽力,并且其操作性更为简单,重复性好。
[Abstract]:The soft magnetic thin film material has an important position in the rapid development of electronic information technology today. However, the amorphous alloy films prepared by the advanced pulsed laser deposition technology have worse properties than the amorphous films with the same composition. Magnetic properties. Pulsed laser deposition technique is used in this paper. Amorphous alloy films of Fe-B-Si-Nb were prepared on single crystal substrates. The surface morphology and thickness of the films were analyzed by scanning electron microscopy (SEM). X-ray diffractometer (XRD) was used to analyze the structure of the films and AFM was used to analyze the surface morphology and roughness of the films. The magnetic properties of the films were tested and analyzed by using the VSM module in the comprehensive physical properties analyzer. The deposition parameters of the films during pulsed laser deposition were discussed. Effects of heat treatment and electron beam irradiation modification on the structure and magnetic properties of Fe-based amorphous alloy films. The main results obtained are as follows: 1) for Fe-based films deposited at room temperature. The deposition rate of the films is slower with the increase of the film thickness, and the roughness of the films will increase with the increase of the thickness. The coercivity of the film increases with the increase of thickness. The increase of substrate temperature will lead to the decrease of the film quality. There are many pores on the surface of the film, and the pore size increases with the increase of deposition temperature. The coarseness of the film also increases with temperature, and the coercivity of the film decreases first and then increases with the increase of deposition temperature. After annealing at 500 鈩,

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