空间环境中污染对光学薄膜性能影响研究

发布时间：2018-02-01 21:34

本文关键词： 空间环境污染带电粒子太阳紫外光学薄膜辐照损伤　出处：《中国科学院研究生院（光电技术研究所）》2015年硕士论文　论文类型：学位论文

【摘要】：空间环境对光学系统而言是一个极其复杂和严酷的环境,在空间环境中运行的光学系统,其性能稳定性和使用寿命都将面临各种各样的威胁,主要包括高真空、太阳紫外辐照、带电粒子辐射、原子氧(AO)、剧烈的热循环、污染、微流星体及空间碎片。为了增强系统中光学元件的性能,元件表面往往会被镀上各种光学薄膜。作为系统中的薄弱环节,光学薄膜自然成为了限制光学系统性能和寿命的重要因素。本文通过分析空间环境中对光学薄膜构成威胁的主要环境因素,结合实验仪器设备进行适当的剪裁和加速模拟试验,分别研究了存在污染的情形下,空间带电粒子辐照和太阳紫外辐照对光学薄膜性能的影响。分别采用真空热蒸发法制备了Hf O2/Si O2膜系1064nm增透膜样品和离子束溅射法制备了紫外波段的Al+Mg F2反射膜样品,样品通过中国科学院国家空间科学中心的粒子辐照装置进行空间带电粒子诱发污染模拟实验;对样品进行溶剂擦拭、紫外清洗、高温退火等处理,测量辐照前后样品的光谱曲线、表面形貌等,对比不同波段光学薄膜样品辐照后光学性能退化情况,尝试说明存在污染情况下不同波段薄膜样品的带电粒子辐照损伤及光学性能退化机制。研究结果表明,空间带电粒子辐照及其诱发污染是导致样品光学性能退化的原因,尤其是紫外波段的Al+Mg F2薄膜样品性能退化较为严重;使用无水酒精和乙醚的混合溶剂擦拭能基本去除两个样品的表面污染;清洁处理后样品光学性能退化的主要原因是带电粒子辐照对样品产生了损伤,紫外波段Al+Mg F2薄膜样品的辐照损伤要比红外波段Hf O2/Si O2膜系的增透膜样品的辐照损伤严重得多,且辐照后Al+Mg F2薄膜样品的表面缺陷明显增多,Hf O2/Si O2膜系的增透膜样品的辐照损伤主要是由位移效应引起的空位损伤。由于优异的物理化学性能和较高的抗激光损伤阈值,Hf O2和Si O2作为高低折射率材料常用于制备1064nm激光薄膜。采用离子束溅射法制备了Hf O2/Si O2膜系的1064nm增透膜样品,预先旋涂邻苯二甲酸二辛脂(DOP)引入污染,通过实验室紫外辐照设备进行太阳紫外辐照诱发污染模拟实验。分别用分光光度计和激光量热计等测量辐照前后样品光学性能的变化;用原子力显微镜(AFM)测量表面粗糙度,并用光学显微镜观察表面污染形貌的演变,为Hf O2/Si O2膜系的增透膜样品的紫外辐照诱发污染行和光学性能退化规律提供实验依据。
[Abstract]:Space environment is an extremely complex and harsh environment for optical systems. The performance stability and service life of optical systems operating in space environment will face a variety of threats, including high vacuum. Solar ultraviolet radiation, charged particle radiation, AOO, intense thermal cycles, pollution, micrometeoroids and space debris. To enhance the performance of optical components in the system. The surface of the element is often coated with a variety of optical thin films, as a weak link in the system. Optical thin films have naturally become an important factor limiting the performance and lifetime of optical systems. In this paper, the main environmental factors that threaten optical thin films in space environment are analyzed. Combined with the experimental instruments and equipment for appropriate tailoring and accelerated simulation tests, respectively, the existence of pollution in the case of the study. Effects of space charged particle irradiation and solar ultraviolet irradiation on the properties of optical thin films. HF _ 2O _ 2 / Si was prepared by vacuum thermal evaporation, respectively. The O _ 2 film is a 1064nm antireflection film and the ultraviolet band Al mg _ (2) F _ (2) reflective film has been prepared by ion beam sputtering. The simulated experiment of space charged particle induced pollution was carried out by particle irradiation device of the National Space Science Center of the Chinese Academy of Sciences. The samples were cleaned by solvent, cleaned by UV and annealed at high temperature. The spectral curves and surface morphology of the samples before and after irradiation were measured, and the degradation of optical properties of the samples after irradiation was compared. The mechanism of radiation damage and degradation of optical properties of charged particles in different bands of thin film samples were studied. The degradation of the optical properties of the samples was caused by the irradiation of space charged particles and its induced pollution, especially the degradation of the properties of Al mg F 2 films in the ultraviolet band. The surface contamination of the two samples can be basically removed by using the mixed solvent of anhydrous alcohol and ether. The main reason for the degradation of the optical properties of the samples after cleaning treatment is the damage caused by the irradiation of charged particles. The radiation damage of ultraviolet-band Al mg F 2 films is much more serious than that of infrared HF O 2 / Sio 2 films. After irradiation, the surface defects of Al mg F 2 films increased obviously. The radiation damage of antireflective films of HF / Sio _ 2 system is mainly caused by the vacancy damage due to the displacement effect, due to the excellent physical and chemical properties and the higher threshold of laser damage. HFO _ 2 and Sio _ 2 as high and low refractive index materials are often used to fabricate 1064nm laser thin films. HfO _ 2 / Si was prepared by ion beam sputtering. O _ 2 film system 1064nm antireflection film sample. Prespin coating of dioctyl phthalate (DOP) to introduce pollution. The simulated experiment of ultraviolet radiation induced pollution was carried out in laboratory. The changes of optical properties of samples before and after irradiation were measured by spectrophotometer and laser calorimeter respectively. The surface roughness was measured by atomic force microscope (AFM) and the morphology of surface contamination was observed by optical microscope. It provides experimental basis for ultraviolet radiation induced pollution and optical degradation of antireflective films of HF / O _ 2 / Sio _ 2 films.
【学位授予单位】：中国科学院研究生院（光电技术研究所）
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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