大气压DBD等离子体沉积SiO_xC_yH_z结构薄膜及其光学性能研究

发布时间：2018-03-22 16:37

本文选题：大气压介质阻挡放电　切入点：等离子体　出处：《东华大学》2017年博士论文　论文类型：学位论文

【摘要】：大气压介质阻挡放电等离子体具有大规模工业应用前景。高效地利用等离子体实现材料表面改性和功能结构构筑是本领域研究的重要课题。本文深入探索了大气压介质阻挡放电等离子体刻蚀行为和沉积行为基本过程,并对沉积的结构薄膜光学性能进行研究。课题采用介质阻挡放电等离子体放电深入研究其刻蚀行为对聚酰亚胺薄膜的活化过程的影响;于被活化的基片表面实施等离子体增强化学气相沉积成功获得SiO_xC_yH_z纳米颗粒、平整、褶皱薄膜,深入讨论各结构薄膜成型机理,揭示各结构薄膜形态生长过程及演变规律;最终分析褶皱薄膜与可见光的光学响应机制,为推广大气压介质阻挡放电等离子体在工业领域应用夯实基础。论文主要包括以下4方面:(1)等离子体刻蚀行为对聚酰亚胺基片的活化作用首先,分析不同放电时间下聚酰亚胺基片表面化学成分、物理形貌、浸润性能的变化,揭示等离子体刻蚀行为下聚酰亚胺基片的活化机制。其次,讨论了功率和氧气等放电参数对等离子体活化聚酰亚胺薄膜的影响。大功率纯氩气放电时,聚酰亚胺薄膜表面出现大量均匀分布的皮屑,剥皮效应明显增加,-c-o-和-c=o等化学键红外谱图中相对吸收峰强度增加;加入氧气后,等离子体放电区域内活性离子浓度增加,放电不均匀性增加,导致聚酰亚胺薄膜表面出现大量刻蚀痕迹,刻蚀不均匀性增加。最后,对聚酰亚胺基片表面亲水性时效性进行研究。(2)等离子体沉积sioxcyhz颗粒/平整薄膜载气氩气流速较慢时,薄膜以岛状生长模式为主,形成颗粒薄膜;当载气氩气流速较快时,薄膜以层状生长模式为主,形成平整连续薄膜。在sioxcyhz颗粒薄膜生长过程中加入氧气可增加无机成分的含量,促进颗粒薄膜由致密状向多孔发生转变,由拒水变为亲水。其次讨论了sioxcyhz平整薄膜的层状生长模式,通过观察平整薄膜受外力后破坏形貌及不同沉积时间薄膜表面化学元素占比,发现平整连续sioxcyhz薄膜存在多层结构,且层与层之间力学性能、化学元素占比差异较大,由下而上si元素逐渐增加,c元素逐渐减少,提出分层生长机制。(3)等离子体沉积sioxcyhz褶皱薄膜特定等离子体放电参数下,可获得sioxcyhz褶皱薄膜。通过研究基片模量、基片温度和放电气氛对sioxcyhz褶皱薄膜的影响和在线检测等手段,发现导致sioxcyhz薄膜褶皱结构产生的应力不是来源于薄膜与基片热力学性能差异,也不源于介质阻挡放电中的丝状放电。随后SiO_xC_yH_z薄膜褶皱正反面的化学成分分析显示褶皱薄膜正面无机成分较多,而反面有机成分较多,这可能是Si OxCyHz薄膜褶皱结构出现的重要原因。此外,对褶皱薄膜成型后生长模式进行探讨,通过扫描电子显微镜和原子力显微镜等结果表明,褶皱结构出现后随沉积时间的延长其不会发生大幅度的二次变形,而是在原有基础上继续生长,由较平坦的褶皱逐步发展为较饱满的褶皱。(4)SiO_xC_yH_z褶皱薄膜光学性能分析了具有一定取向、Z字形、各向同性、大尺度等不同形貌的褶皱的光学响应情况。通过分析发现,白光入射时各不同形貌的褶皱均显示出强烈的分光效果,体现出光栅特性,且不同形貌的褶皱都满足基本光栅方程。进一步对Z字形衍射光强度进行理论计算,分析了各衍射点出现的位置及原因。对各向同性的褶皱,分析了单/多圆环形衍射图案出现原因。对于大尺度褶皱,出现多级衍射明纹。褶皱中可能包含不同光栅常数的多重光栅结构,光栅常数的选取需要科学的分析。
[Abstract]:Atmospheric pressure dielectric barrier discharge plasma has a large-scale industrial application. The efficient use of plasma surface modification and functional structure is an important topic in the research field. This paper explores the basic process of atmospheric dielectric barrier discharge plasma etching and deposition behavior, and study the structure of thin film optical properties of paper deposition. Effect of in-depth study of the activation process of Etching Behavior of polyimide film dielectric barrier discharge plasma discharge; in the activated substrate surface plasma enhanced chemical vapor successfully obtained SiO_xC_yH_z nanoparticles, sedimentary formation, fold film, in-depth discussion of the structure of the film forming mechanism, process and reveal the regularity of the structural evolution of films; finally analysis of optical thin film folds and visible light response mechanism for the promotion of atmospheric pressure Dielectric barrier discharge plasma applications in the industrial field and lay a solid foundation. The paper mainly includes the following 4 aspects: (1) the role of plasma etching behavior on the activation of polyimide substrate firstly, analysis of different discharge time of polyimide under substrate surface chemical composition, physical morphology, wettability change, plasma etching behavior reveals the activation mechanism under the polyimide substrate secondly, the influence of power and oxygen discharge parameters such as polyimide film activation on plasma discharge is discussed. High power argon, a uniform distribution of dander appear polyimide film surface, peeling effect increased significantly, -c-o- and -c=o chemical bonds in the infrared spectrum relative intensity of absorption peak increases; with the oxygen, increase the activity of ion the concentration of plasma in the discharge region, discharge inhomogeneity increases, resulting in a large number of etching marks appearing on polyimide film surface Trace etching nonuniformity increases. Finally, research on polyimide surface hydrophilic substrate of timeliness. (2) plasma deposition of sioxcyhz particles / flat film argon gas velocity is relatively low, film to island growth mode, the formation of granular films; when argon gas flow rate is fast, film with layered growth pattern, forming a smooth and continuous film. Adding sioxcyhz particles during the growth process of thin film oxygen can increase the content of inorganic composition, promote particle film from compact to porous change by water repellent to hydrophilic. Secondly, the layered growth model of sioxcyhz film formation, through the observation of flat films by external forces and different damage morphology the deposition time of the film surface chemical elements accounted for, find a smooth and continuous sioxcyhz film is a multi-layer structure, mechanical properties and between layer and layer, chemical elements accounted for the difference is large, which is The Si element is gradually increased, C elements gradually decrease, the stratified growth mechanism. (3) plasma deposition of sioxcyhz thin film of plasma parameters under specific folds, sioxcyhz can be obtained by studying the substrate film. Fold modulus, substrate temperature and discharge atmosphere effect on sioxcyhz fold film and online testing and other means, that leads to the generation of sioxcyhz membrane structure stress is not derived from the film and the substrate thermodynamic performance differences, also do not originate from the filamentary dielectric barrier discharge discharge in the chemical composition of SiO_xC_yH_z thin films. Then fold positive and negative analysis showed more positive fold thin film inorganic composition, and organic components were negative, which may be an important cause of fold structure of Si OxCyHz thin film. In addition, the growth model discussed fold film forming, by scanning electron microscopy and atomic force microscopy results show that, The fold structure appears with prolonging deposition time it will not happen two times large deformation, but continued growth on the basis of the original, a relatively flat fold gradually developed into a fuller fold. (4) the optical properties of SiO_xC_yH_z films were analyzed with fold orientation, Z shape, isotropic optical response of fold large scale with different morphologies. The analysis found that the incidence of the different morphologies of the white folds showed strong light effect, reflecting grating characteristics, and different morphologies of the folds are meet the basic equations. A grating for theoretical calculation of diffraction light intensity Z shape, position and reason analysis the diffraction spots appear. For isotropic folds, analysis of single / multiple circular diffraction patterns appear. For large scale folds, appear multilevel diffraction grating. The bright regions may contain different folds in the constant The selection of the multiple grating structure and the grating constant need to be scientifically analyzed.

【学位授予单位】：东华大学
【学位级别】：博士
【学位授予年份】：2017
【分类号】：TB383.2

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