三氧化钨基光电极的制备、表征和光电化学性质研究

发布时间：2018-04-03 16:25

  本文选题：三氧化钨薄膜电极　切入点：氢氧化镍　出处：《上海师范大学》2015年硕士论文

【摘要】：近年来半导体光催化剂在能源和环境中的应用发展迅速,目前已有大量相关文献报道WO3半导体材料,但WO3自身存在一些缺点如禁带宽度相对较窄,使其在实际中的应用受到限制。为了克服或者降低WO3本身的缺陷,需要对WO3进行修饰。因此本论文分别采用添加Ni(OH)2催化剂,制备FTO/WO3/Bi VO4复合膜和对WO3薄膜的表面形貌进行改善的方法对WO3薄膜进行改性,初步研究了它们的光电化学性能。本论文研究分为三个部分:(1)FTO/WO3/N i(OH)2薄膜光电极的制备及其光电化学和光电催化性能研究。通过简单的溶胶凝胶-浸渍法,经过高温退火后制备出FTO/WO3/Ni(OH)2光电极。产物经XRD、SEM、DRS、Raman、CV等方法表征。通过该实验,我们发现不修饰Ni(OH)2的裸露三氧化钨电极几乎没有光电催化葡萄糖的效果;在三氧化钨薄膜的表面修氢氧化亚镍能够增强三氧化钨薄膜的光电效应。(2)FTO/WO3/Bi VO4薄膜光电极的制备及其光电化学和光电催化性能研究。本文采用了比较简便的溶胶-凝胶法方法:滴涂-煅烧-滴涂-煅烧的方法合成了FTO/WO3/Bi VO4复合膜。通过XRD,DRS,SEM和拉曼的表征方法,对复合膜和纯WO3和纯Bi VO4薄膜进行了比较,进而也对这三种光电极的光电化学性质进行了比较。实验结果为FTO/WO3/Bi VO4复合膜电极在光解水反应中电流最大。(3)多空FTO/WO3薄膜光电极的制备及其光电化学和光电催化性能研究。本文中我们使用了一种简单的硬模板法一步制得了多孔三氧化钨光电极用于光解水的实验。通过XRD,DRS,SEM,拉曼和电化学性质的测试我们得出当硬膜板介空碳的百分含量为10%时,我们制得的三氧化钨薄膜光电极具有较好的光电化学性质。
[Abstract]:The application of semiconductor photocatalysts in energy and environment has developed rapidly in recent years. At present, WO3 semiconductor materials have been reported in a large number of related literatures. However, WO3 itself has some disadvantages, such as relatively narrow band gap.Its application in practice is limited.In order to overcome or reduce the defects of WO3 itself, it is necessary to modify WO3.Therefore, in this thesis, the FTO/WO3/Bi VO4 composite films were prepared by adding Ni(OH)2 catalysts and the surface morphology of WO3 films was improved. The photochemical properties of WO3 films were preliminarily studied.This thesis is divided into three parts: the preparation of the photoelectrode of FTO / WO _ 3 / N i(OH)2 thin film and its photochemical and photocatalytic properties.A simple sol-gel impregnation method was used to prepare FTO/WO3/Ni(OH)2 photoelectrode after high temperature annealing.The product was characterized by the method of XRDX SEMN DRSX Ramanbutae CV and so on.Through this experiment, we found that bare tungsten trioxide electrode without modification of Ni(OH)2 has little photocatalytic effect on glucose.The modification of nickel hydroxide on the surface of tungsten trioxide film can enhance the photoelectric effect of tungsten trioxide thin film. The preparation of photoelectrode and its photochemical and photocatalytic properties of VO4 thin film with FTO / WO _ 3 / Bi have been studied.In this paper, the FTO/WO3/Bi VO4 composite membrane was synthesized by a simple sol-gel method: drop coating, calcination, drop coating and calcination.The photochemical properties of the composite films were compared with those of pure WO3 films and pure Bi VO4 films by means of XRD DDS SEM and Raman spectroscopy, and the photochemical properties of the three photoelectrodes were also compared.The experimental results show that the photoelectrode of FTO/WO3/Bi VO4 composite membrane electrode has the largest current in the photodissociation of water, and the photoelectrochemical and photocatalytic properties of the FTO/WO3 film photoelectrode are studied.In this paper, we use a simple hard template method to prepare porous tungsten trioxide photoelectrode for photolysis of water.Based on the measurements of the XRDX DRSU SEM, Raman and electrochemical properties, we have obtained that the photoelectrode of tungsten trioxide film has good photochemical properties when the content of meso-carbon in the hard plate is 10%.
【学位授予单位】：上海师范大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：O643.36;TB383.2

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