反应共溅射Ti-Si-N纳米复合膜的结构与性能

发布时间：2018-04-12 09:19

  本文选题：磁控溅射 + Ti-Si-N　； 参考：《沈阳大学》2015年硕士论文

【摘要】：Ti N薄膜因其高硬度、高耐磨性、高熔点等优良性能,在磨具、机械、航空等领域得到广泛的应用。通过向薄膜中添加Al、Si等元素可以改善薄膜的性能来满足日益增长的需求。在过去的几十年里,Ti-Si-N纳米复合膜由于优异的机械性能已引起了广泛的关注。然而薄膜的最佳结构和性能难以获得,因此对薄膜制备工艺的研究仍具有重要意义。本文利用反应磁控共溅射技术,在不同的工艺条件下制备了Ti-Si-N纳米复合膜。利用X射线衍射、原子力显微镜和场发射扫描电镜对薄膜的相结构与表面微观形貌进行了分析;利用划痕法、纳米压痕技术对薄膜的力学性能进行了测量;用电化学技术探究了Ti-Si-N纳米复合膜的工艺参数对薄膜耐腐蚀性能的影响。研究了Si靶功率对Ti-Si-N纳米复合膜结构和性能的影响,结果表明:Si3N4是以非晶态的形式出现在薄膜中。随着Si靶功率的增加,薄膜的择优取向由(111)晶面转变为(200)晶面,晶粒尺寸先减小后增大。薄膜表面变得更加光滑致密,薄膜的膜基结合力、硬度以及耐腐蚀性随Si靶功率的增加逐渐变好。但过高的Si靶功率会使薄膜性能下降。研究了基体温度(100℃~400℃)对薄膜结构和性能的影响,结果表明:薄膜在低温条件下晶粒尺寸较小但表面的大颗粒较多,表面粗糙度较大。随着温度的升高,晶粒尺寸略有增加,但表面颗粒均匀,平整度增加。基体温度在300℃时,薄膜的膜基结合力最大为46 N,硬度值也达到最大值为23.0 GPa,腐蚀性也最好。温度继续增加,薄膜中部分晶粒尺寸迅速增加,相关力学性能和抗腐蚀性能降低。研究了负偏压对薄膜结构和性能的影响,结果表明:随着负偏压的增加,薄膜中Ti N(111)晶面衍射峰减弱,(200)晶面衍射强度增强;薄膜的平均晶粒尺寸和表面粗糙度先减小后增大。在负偏压为-120V时薄膜的平均晶粒尺寸最小,为8.6 nm,薄膜的膜基结合力和耐腐蚀性能最好。在负偏压为-80V时,薄膜表面粗糙度最小,为3.63 nm。通过探究N2流量对薄膜结构和性能的影响发现:薄膜择优取向为(200)晶面,平均晶粒尺寸基本不变,N2流量对薄膜择优取向和平均晶粒尺寸影响不大。N2流量的增加会使薄膜晶粒进一步细化,组织均匀。在N2流量比为8 m L/min时,薄膜表面粗糙度最小为3.18 nm,膜基结合力达最大值31 N,此时薄膜的硬度和弹性模量也最高,分别为15.8 GPa和279.2 GPa。但过高的氮气流量会使薄膜的性能降低。
[Abstract]:Tin thin films have been widely used in abrasive, mechanical, aviation and other fields because of their high hardness, high wear resistance and high melting point.The properties of the films can be improved by adding Al Si and other elements to the films to meet the increasing demand.In the past few decades, Ti-Si-N nanocomposite films have attracted wide attention due to their excellent mechanical properties.However, the optimal structure and properties of the films are difficult to obtain, so the study of the preparation process of the films is still of great significance.In this paper, Ti-Si-N nanocomposite films were prepared under different conditions by reactive magnetron co-sputtering.X-ray diffraction, atomic force microscope and field emission scanning electron microscope were used to analyze the phase structure and surface morphology of the films, and the mechanical properties of the films were measured by scratch method and nano-indentation technique.The effect of process parameters on the corrosion resistance of Ti-Si-N nanocomposite films was investigated by electrochemical technique.The effect of Si target power on the structure and properties of Ti-Si-N nanocomposite films was investigated. The results show that the structure and properties of Ti-Si-N nanocomposite films are in the form of amorphous Si _ 3N _ 4.With the increase of Si target power, the preferred orientation of the thin film changes from 111) to 200), and the grain size decreases first and then increases.The surface of the film becomes smoother and denser, and the adhesion, hardness and corrosion resistance of the film become better with the increase of Si target power.However, the properties of the films will be decreased when the Si target power is too high.The effects of substrate temperature (100 鈩，

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