金刚石粉体表面CVD法镀钨的工艺研究

发布时间：2018-04-23 14:32

  本文选题：化学气相沉积 + 金刚石粉体　； 参考：《表面技术》2017年02期

【摘要】：目的增强金刚石与基体的界面结合能力。方法首先对金刚石粉体进行"除有机物→除油→粗化→烘干"处理。采用自制化学气相沉积装置,研究了以H_2和WF_6为反应气体在金刚石表面CVD法镀覆钨工艺。使用扫描电镜(SEM)、能谱(EDS)、X射线衍射(XRD)、透射电镜(SEM)等检测方法,分析了金刚石粉体镀层钨的微观形貌、成分、组织结构,对镀层包覆金刚石粉体相关性能进行了初步测试。结果在粒径约为223.6mm的金刚石表面获得均匀致密镀覆层的最佳工艺参数为:沉积温度670℃,沉积时间2 min,H_2通入量1 L/min,WF_6消耗量2 g/min。沉积温度为580℃时,获得的均匀致密钨镀层的厚度为150 nm,且镀层杂质含量较少。将镀覆钨的金刚石和普通金刚石分别与铜粉热压烧结后进行抗弯强度测试,结果显示含镀覆钨的金刚石试样抗弯强度提高了38.6%。加入镀钨金刚石压块的热膨胀系数比加入普通金刚石的有所降低,并且加入的镀钨金刚石粉体越多,压块的热膨胀系数越低。结论镀钨后的金刚石颗粒的表面性能得到改善,与基体的结合能力得到提高。
[Abstract]:Objective to enhance the interfacial bonding ability of diamond and matrix. Methods the diamond powder was first treated by "coarsening and drying of organic matter." A self-made chemical vapor deposition device was used to study the process of tungsten plating on diamond surface by CVD method using Hs2 and WF_6 as reaction gases. Scanning electron microscopy (SEM), EDS-X ray diffraction (XRD) and transmission electron microscopy (TEM) were used to analyze the microstructure, composition, microstructure and properties of diamond coated diamond powder. Results the optimum process parameters for obtaining uniform and compact coating on diamond surface with diameter about 223.6mm are as follows: deposition temperature 670 鈩，

本文编号：1792362