Ag薄膜表面粗糙度的研究

发布时间：2018-04-29 09:53

本文选题：磁控溅射 + 电阻蒸发　；参考：《四川师范大学》2015年硕士论文

【摘要】：Ag薄膜由于其优良的光电性质及广泛的应用前景而备受科研工作者的关注。近几年,纳米金属Ag材料的表面等离子体激元(SPP)由于其独特的光学特性,更是成为了当前的重要研究课题。传统的光学成像因受衍射极限的存在的限制,导致光学成像分辨率最大只能达到入射光波长的二分之一。为了突破衍射极限从而实现超衍射光学成像,国内外科研工作者提出了超透镜器件来实现这一目标。而作为超透镜器件重要组成部分的Ag薄膜也成为众多学者研究的对象。实现超透镜器件,需要解决好几项关键技术,透镜器件重要组成部分的Ag薄膜表面粗糙度就是其中之一。本文以此为研究对象,研究制备工艺对Ag膜表面粗糙度的影响及理论模拟Ag膜表面粗糙度对透镜器件成像的影响。研究的主要内容和结果如下:1.运用理论仿真模拟软件,研究Ag膜表面粗糙度在超透镜器件中的作用和影响。发现随着银层的粗糙度的增加,成像质量的对比度逐渐降低;当RMS等于零(理想情况)时,其成像质量的对比度为0.93,当RMS增加到2.6 nm时,成像质量的对比度降到0.6。2.采用蒸发法和磁控溅射两种方法制备了Ag薄膜,系统研究了Ag薄膜的表面形貌性质。为改进超透镜器件中Ag薄膜表面粗糙度提供了依据。3.研究在磁控溅射制备的Ag膜,溅射功率和溅射压强对Ag膜沉积速率和表面粗糙度影响。发现用磁控溅射方法改变工艺参数,RMS可从5.0 nm减小到1.1nm。在相同溅射功率下,溅射气压从1.0 Pa升到3.0 Pa,Ag膜沉积速率和表面粗糙度随溅射气压增大呈减小趋势。4.研究在电阻蒸发条件下,加入Cu种子层对Ag膜表面粗糙度、粒径大小和Sk和Ku等参数的影响。
[Abstract]:Due to its excellent photoelectric properties and wide application prospects, Ag thin films have attracted the attention of researchers. In recent years, the surface plasmon excitation (SPP) of nanometallic Ag materials has become an important research topic due to its unique optical properties. Due to the limitation of diffraction limit, the resolution of traditional optical imaging can only reach 1/2 of the incident wavelength. In order to break through the diffraction limit and realize the hyperdiffractive optical imaging, researchers at home and abroad have proposed a hyper lens device to achieve this goal. As an important part of hyper lens devices, Ag thin films have been studied by many scholars. The surface roughness of Ag thin film is one of the most important components of lens devices. In this paper, the effect of preparation process on the surface roughness of Ag film and the influence of surface roughness of Ag film on the imaging of lens devices are studied. The main contents and results of the study are as follows: 1. The effect of surface roughness of Ag film on superlens devices is studied by using theoretical simulation software. It is found that the contrast of the imaging quality decreases with the increase of the roughness of the silver layer, and the contrast of the imaging quality decreases to 0.6.2 when the RMS is equal to zero (ideally), and the contrast of the imaging quality decreases to 0.6.2 when the RMS increases to 2.6 nm. The Ag thin films were prepared by evaporation and magnetron sputtering. The surface morphology of Ag thin films was studied systematically. It provides a basis for improving the surface roughness of Ag thin films in hyper lens devices. The effects of sputtering power and sputtering pressure on the deposition rate and surface roughness of Ag films prepared by magnetron sputtering were studied. It is found that the RMS can be reduced from 5.0 nm to 1.1 nm by magnetron sputtering. At the same sputtering power, the deposition rate and surface roughness of Ag films increased from 1.0 Pa to 3.0 Pa and the surface roughness decreased with the increase of sputtering pressure. The effects of Cu seed layer on the surface roughness, particle size, Sk and Ku of Ag film were studied under the condition of resistance evaporation.
【学位授予单位】：四川师范大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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