新型纳米压印材料的研究与应用

发布时间：2018-06-23 23:43

本文选题：纳米压印 + 甲基丙烯酸异冰片酯　；参考：《南京大学》2015年硕士论文

【摘要】：纳米技术从上世纪50年代中期开始至今经历了一个蓬勃的发展,人们对于纳米尺度下的结构与材料的研究表现出了极大的热情,也基于此,各种纳米加工技术如光学光刻技术、离子束加工技术、电子束曝光技术、纳米压印技术、自组装技术等应运而生且不断发展。在这其中,纳米压印技术由于其高分辨率、高产率以及低成本的加工优点,得到了人们的广泛关注,是目前实验室制备纳米图案的主要方法之一,同时在工业生产中也初步得到了应用。纳米压印胶作为纳米压印技术中最关键的要素之一,广泛应用于热纳米压印、紫外光固化纳米压印和软光刻(soft lithography)工艺中,按照压印类型,主要可以分为热塑型纳米压印胶和紫外光固化纳米压印胶。目前常用的热塑型纳米压印胶主要有聚甲基丙烯酸甲酯和聚苯乙烯,在纳米压印中各有优缺点；基于阳离子聚合的紫外光固化中的引发剂目前主要是一些光产酸剂,但是这类引发剂在光照后容易产生对压印胶材料或者衬底有腐蚀性的酸类物质。本文的工作主要针对这两个问题做了改进,具体如下：合成了一种热塑性高分子聚甲基丙烯酸异冰片酯(PIBMA)并将其应用于纳米压印胶中。利用自由基聚合反应,以甲基丙烯酸异冰片酯为单体合成了不同分子量的PIBMA,研究了引发剂的用量对于聚合物分子量的影响。测试了不同分子量的PIBMA的热分解温度、玻璃化转变温度等,将其应用于热纳米压印胶中,研究了分子量对于压印图形保真度的影响。选择一个合适分子量的PIBMA作为热纳米压印胶,利用不同的压印模板进行压印,获得了亚50nm尺度图形的复制能力。与常用的PMMA相比,PIBMA具有更高的机械强度和更好的抗刻蚀性：与常用的PS相比,PIBMA具有更好的举离效果。聚甲基丙烯酸异冰片酯在光学增透中的应用。蓝宝石由于其机械强度高、热力学和化学性质稳定,具有一定的光学透过率,因此作为一些器件和设备的屏幕逐渐得到了应用。但是存在一个最主要的问题,可见光波段范围内的光学透过率只有65%～75%,这也限制了它的应用。由于聚甲基丙烯酸异冰片酯具有很高的光学透过率,我们在蓝宝石衬底上以PIBMA为压印胶,利用纳米压印制备了不同的光子晶体结构,以提升蓝宝石的光学透过率。蓝宝石平片的透射率在65%到75%之间,具有600 nm周期孔阵列结构的蓝宝石片透射率达到80%-90%。光产碱剂的合成与应用。在阳离子聚合的紫外光固化体系中常使用光酸剂作为引发剂,然而光酸剂在曝光后容易产生对压印胶材料或者衬底具有腐蚀性的酸类物质,因此限制了这种光酸剂的使用。光产碱剂也可以作为一类引发剂,目前它的研究并不多,在纳米压印胶中的应用也很少。我们合成了一种光产碱剂N-N二甲基二硫代氨基苯乙酮,简称QAsalt Ⅰ-S。并将其应用于紫外光固化纳米压印胶中,利用红外光谱研究了其光引发过程,同时利用复合纳米压印(HNSL)技术验证了这种以光产碱剂为引发剂的纳米压印胶的压印性能。
[Abstract]:Nanotechnology has experienced a flourishing development since the mid 50s of the last century. People have shown great enthusiasm for the study of nanostructures and materials. Based on this, various nanoscale technologies such as optical lithography, ion beam processing, electron beam exposure, nano imprint technology, self-assembly technology As a result of its high resolution, high yield and low cost processing advantages, nano imprint technology has been widely paid attention to. It is one of the main methods to prepare the nano pattern in the laboratory. At the same time, it has also been applied in the industrial production. The nano imprint adhesive is used as the nano imprint. One of the most critical elements in technology is widely used in hot nano imprint, UV curable nano imprint and soft lithography technology. According to the type of embossing, it can be divided into hot plastic nano imprint adhesive and UV curable nano imprint adhesive. The main hot plastic nano imprint adhesive is mainly polymethyl methacrylate at present. And polystyrene, each has its advantages and disadvantages in the nano imprint, and the initiator in UV curing based on cationic polymerization is mainly a number of light producing acids, but this kind of initiator is easy to produce corrosivity acid materials on the imprint material or substrate after illumination. The work of this paper is mainly to improve the two problems. A thermoplastic polymer polyacrylate (PIBMA) was synthesized and applied to nano imprint adhesive. The PIBMA of different molecular weight was synthesized by free radical polymerization, using ISO methacrylate as monomer. The influence of the amount of initiator on the molecular weight of the polymer was studied. The thermal decomposition temperature and glass transition temperature of the molecular weight PIBMA were applied to the thermal nano imprint adhesive. The influence of molecular weight on the fidelity of imprint graphics was studied. A suitable molecular weight PIBMA was selected as the hot nano imprint adhesive and the different embossing formwork was used to press the printing. The replication ability of the sub 50nm scale was obtained. Compared with common PMMA, PIBMA has higher mechanical strength and better corrosion resistance: compared with common PS, PIBMA has a better lift effect. The application of polyacrylate polymethacrylate in optical penetration. Sapphire has a certain optical transmittance because of its high mechanical strength, thermodynamic and chemical properties, so it has a certain optical transmittance. The screen for some devices and devices has been gradually applied. But there is one of the most important problems, the optical transmittance within the range of visible light is only 65% to 75%, which also limits its application. Because of the high optical transmittance of polyacrylate methacrylate, we use PIBMA as embossing adhesive on the sapphire substrate. Different photonic crystal structures were prepared by nano imprint to improve the optical transmittance of sapphire. The transmittance of sapphire flat was between 65% and 75%. The transmittance of sapphire slices with 600 nm periodic hole array structure reached the synthesis and application of 80%-90%. light producing alkali. As an initiator, however, the photoacid can easily produce corrosive acid materials on the imprint material or substrate after exposure. Therefore, the use of this photoacid is limited. The light producing alkali can also be used as a kind of initiator. At present, it has not been studied much, and the application in nanoscale adhesive is very few. The agent N-N two methyl two thiophenyl acetophenone, referred to as QAsalt I -S., was applied to UV curable nano imprint adhesive, and its photoinitiating process was studied by infrared spectroscopy. At the same time, the imprint performance of the nano imprint adhesive with a light producing agent was verified by the composite nano imprint (HNSL) technology.
【学位授予单位】：南京大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.1;TQ317

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