热丝CVD沉积金刚石薄膜时的等离子体空间分布研究

发布时间：2018-08-18 15:25

【摘要】：采用热丝化学气相沉积(chemical vapordeposition,CVD)的方法,以丙酮为碳源生长金刚石薄膜时,利用等离子体发射光谱对生长过程中的等离子体空间分布进行了在线诊断。采用SEM,Raman光谱分别对沉积金剐石膜表面、断面的形貌和质量进行表征。光谱分析表明,对于线性阵列布丝情况下,中心区域与边缘区域的基团分布存在差异,中心区温度高,裂解能力强,基团强度高于两边,但中心区域基团特征峰强度的变化比等离子球平缓的多;距离热丝越远,热辐射减小,从丙酮分子中裂解出CH和CO等基团以及由原子H激发的H_β与H_α等强度降低,反而使得复合生成的C2基团增加。SEM测试结果表明,当丝基间距为4.5,5.5,6.5 mm时,所沉积的金刚石薄膜表面由致密规则晶面向混乱转变,且单位时间内的生长速率也依次降低,此外,Raman光谱表明随着纵向间距的加大,金刚石薄膜的质量随之降低。这与诊断结果中CH和CO强度的降低,C_2基团强度增加及基团C_2/H_α比强度下降相吻合。
[Abstract]:Chemical vaporization vapor deposition (HCVD) was used to diagnose the plasma spatial distribution in the growth process of diamond films grown with acetone as a carbon source. SEM Raman spectra were used to characterize the morphology and quality of the surface and cross section of the deposited gold sloughing film. The spectral analysis shows that the distribution of groups in the center region and the edge region is different in the case of linear array arrangement, the temperature of the center region is high, the cracking ability is strong, and the strength of the group is higher than that of the two sides. But the change of the characteristic peak intensity of the group in the center region is much slower than that of the plasma sphere, the farther away from the hot filament, the decrease of the thermal radiation, the splitting of the groups such as Ch and CO from the acetone molecule and the decrease of the intensity of H _ 尾 and H _ 伪 excited by the atom H, On the contrary, the results of SEM show that the surface of diamond film changes from dense regular crystal to chaos, and the growth rate of diamond film decreases in turn when the distance of filament base is 4.5 ~ 5.5 ~ (-6.5) mm. In addition, Raman spectra show that the quality of diamond films decreases with the increase of longitudinal spacing. This is consistent with the decrease of Ch and CO strength in the diagnostic results and the increase of the strength of the C _ 2 group and the decrease of the specific strength of the group C _ 2 / H _ 伪.
【作者单位】：武汉工程大学材料科学与工程学院湖北省等离子体化学与新材料重点实验室;
【基金】：国家自然科学基金项目(11175137) 武汉工程大学研究生教育创新基金项目(CX2014066)资助
【分类号】：TB306

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