笔式连续直写的纳米加工技术研究
发布时间：2018-09-05 14:52
【摘要】：微纳技术是一个多学科交叉的高科技领域,展现出巨大的生命力,被认为是未来重要前沿科技之一。以扫描探针显微镜SPM为基础的扫描探针加工技术,是一种简单而又灵活的微纳结构加工方法,近年来引起了广泛的关注并得到了快速的发展。作为扫描探针加工的一种新技术,纳米钢笔直写技术FPN具有精度高、分辨率高、直接书写、可控性好等特点,能够将多种墨水直接转移到不同性质的基底上,进而书写出不同的加工图案,加工出高精度的结构器件,在生物、微电子领域等方面有着非常广阔的应用前景。针对目前对于FPN工作机理及加工工艺研究较少的现状,本文首先对FPN工作过程中起主导作用的毛细力进行了研究,分析了毛细力的形成及其作用机理,为FPN的工作机理提供理论基础。在此基础上分析了FPN书写过程中的三个主要步骤:针尖与基底间液桥的形成、墨水分子在液桥中的传输以及墨水分子在基底的扩散,并对针尖和基底接触的作用力进行了建模,分析了针尖逐渐接触基底的过程中接触力大小的变化。其次利用原子力显微镜选用纳米银墨水在金基底上进行了FPN书写实验,分别探讨了FPN书写过程中各类书写参数对点、线结构尺寸的影响,其中影响点直径的书写参数为接触时间,影响线结构尺寸的参数主要包括探针孔径、书写模式、书写速度、设定点以及施加的电压等。在此基础上,选择最佳工艺参数,即200nm孔径的书写探针,2μm/s的书写速度以及0.2V的设定点,在接触模式下实现了字母“S”“Z”“D”“X”及五角星等规则图案的书写。最后在非导电云母基底上利用FPN技术书写出微纳尺度的线结构,利用原子力显微镜AFM和扫描电子显微镜SEM对线结构的形貌进行了表征。在此基础上,结合Keithley4200SCS半导体参数分析仪和Cascade M150探针台,采用二探针法和四探针法分别对FPN书写线结构的电学特性进行了测量。和二探针相比较,四探针法能精确地测量单根线结构的电阻率,测得书写线结构的电阻率为4.82μΩ·cm,略大于银的体电阻率,这可能是由于微纳尺度线结构产生的表面散射效应增加了电阻率的值。
[Abstract]:Micro-nano technology is a multi-disciplinary high-tech field, showing great vitality, is considered as one of the important frontier science and technology in the future. Scanning probe processing based on scanning probe microscope (SPM) is a simple and flexible fabrication method of micro / nano structure, which has attracted wide attention and been developed rapidly in recent years. As a new technology of scanning probe processing, FPN has the characteristics of high precision, high resolution, direct writing, good controllability, and can transfer many kinds of ink directly to different kinds of substrates. And then write out different processing patterns, processing high-precision structural devices, which has a very broad application prospects in biology, microelectronics and other fields. In view of the lack of research on the working mechanism and processing technology of FPN, the capillary force, which plays a leading role in the process of FPN, is studied in this paper, and the formation and mechanism of capillary force are analyzed. It provides a theoretical basis for the working mechanism of FPN. On this basis, three main steps in the writing process of FPN are analyzed: the formation of liquid bridge between the tip and substrate, the transmission of ink molecules in the liquid bridge and the diffusion of ink molecules in the substrate, and the interaction force between the tip and the substrate is modeled. The change of the contact force during the gradual contact between the tip and the substrate is analyzed. Secondly, the FPN writing experiment was carried out on the gold substrate with nano-silver ink selected by AFM. The influence of various writing parameters on the points and the size of the line structure in the FPN writing process was discussed respectively. The writing parameters affecting the diameter of the point are contact time, and the parameters affecting the size of the line structure include probe aperture, writing mode, writing speed, setting point and applied voltage, etc. On this basis, the optimal process parameters, namely the writing speed of 2 渭 m / s of 200nm aperture and the setting point of 0.2 V, are selected to realize the writing of regular patterns such as "S" Z "," D "X" and "pentagram" in contact mode. Finally, the micronanoscale linear structure was written on the non-conductive mica substrate by FPN technique. The morphology of the linear structure was characterized by atomic force microscope (AFM) and scanning electron microscope (SEM). On this basis, combining with Keithley4200SCS semiconductor parameter analyzer and Cascade M150 probe table, the electrical characteristics of FPN writing line structure were measured by two probe method and four probe method, respectively. Compared with the two probes, the four-probe method can accurately measure the resistivity of a single wire structure, and the resistivity of the writing line structure is 4.82 渭 惟 cm, slightly larger than the bulk resistivity of silver. This may be due to the surface scattering effect resulting from the micro- and nanoscale line structure, which increases the resistivity value.
【学位授予单位】：苏州大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TS951.13;TB383.1
本文编号：2224610
[Abstract]:Micro-nano technology is a multi-disciplinary high-tech field, showing great vitality, is considered as one of the important frontier science and technology in the future. Scanning probe processing based on scanning probe microscope (SPM) is a simple and flexible fabrication method of micro / nano structure, which has attracted wide attention and been developed rapidly in recent years. As a new technology of scanning probe processing, FPN has the characteristics of high precision, high resolution, direct writing, good controllability, and can transfer many kinds of ink directly to different kinds of substrates. And then write out different processing patterns, processing high-precision structural devices, which has a very broad application prospects in biology, microelectronics and other fields. In view of the lack of research on the working mechanism and processing technology of FPN, the capillary force, which plays a leading role in the process of FPN, is studied in this paper, and the formation and mechanism of capillary force are analyzed. It provides a theoretical basis for the working mechanism of FPN. On this basis, three main steps in the writing process of FPN are analyzed: the formation of liquid bridge between the tip and substrate, the transmission of ink molecules in the liquid bridge and the diffusion of ink molecules in the substrate, and the interaction force between the tip and the substrate is modeled. The change of the contact force during the gradual contact between the tip and the substrate is analyzed. Secondly, the FPN writing experiment was carried out on the gold substrate with nano-silver ink selected by AFM. The influence of various writing parameters on the points and the size of the line structure in the FPN writing process was discussed respectively. The writing parameters affecting the diameter of the point are contact time, and the parameters affecting the size of the line structure include probe aperture, writing mode, writing speed, setting point and applied voltage, etc. On this basis, the optimal process parameters, namely the writing speed of 2 渭 m / s of 200nm aperture and the setting point of 0.2 V, are selected to realize the writing of regular patterns such as "S" Z "," D "X" and "pentagram" in contact mode. Finally, the micronanoscale linear structure was written on the non-conductive mica substrate by FPN technique. The morphology of the linear structure was characterized by atomic force microscope (AFM) and scanning electron microscope (SEM). On this basis, combining with Keithley4200SCS semiconductor parameter analyzer and Cascade M150 probe table, the electrical characteristics of FPN writing line structure were measured by two probe method and four probe method, respectively. Compared with the two probes, the four-probe method can accurately measure the resistivity of a single wire structure, and the resistivity of the writing line structure is 4.82 渭 惟 cm, slightly larger than the bulk resistivity of silver. This may be due to the surface scattering effect resulting from the micro- and nanoscale line structure, which increases the resistivity value.
【学位授予单位】：苏州大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TS951.13;TB383.1
【参考文献】
相关硕士学位论文 前1条
1 朱吉牧;基于原子力显微镜的纳米加工技术及软件系统研究[D];浙江大学;2005年
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