脉冲偏压电弧离子镀Cr-O薄膜制备及其性能研究

发布时间：2018-09-07 16:19

【摘要】：氧化铬因其具有高硬度、高温稳定性、高化学稳定性及抗腐蚀等性能,被广泛应用于冶金、颜料、磨料、耐火材料及新发展的熔喷涂料等方面。近年来对氧化铬薄膜的研究主要集中在成分结构、机械性能、摩擦磨损性能与作为太阳能选择吸收薄膜的可行性等。本论文采用脉冲偏压电弧离子镀技术在石英玻璃及硅片上制备铬的氧化物薄膜,并对薄膜的成分、结构、力学性能及光学性能进行研究,以期获得具有良好力学性能及光学性能的氧化铬薄膜,目的在于能在发展离子镀膜工艺技术的同时,进一步丰富可用于表面改性的陶瓷薄膜材料库。首先,在仅改变氧气流量情况下采用脉冲偏压电弧离子镀技术在石英玻璃及(111)单晶硅基片上制备一系列Cr-O薄膜。研究了氧气流量(40 sccm-200 sccm)对薄膜表面形貌、结构、硬度及光学性能的影响。研究结果表明：采用脉冲偏压技术成功制备出了一系列Cr-O薄膜；所得薄膜表现出良好的表面质量；薄膜中各元素的含量基本保持相对稳定。薄膜的硬度均在19.0 GPa以上,并且在氧气流量为160 sccm时达到最大值24.8GPa；当氧气流量为80 sccm时所得薄膜表现出良好的透光率,最大值为71%；其光学带隙也达到了最大值1.81 eV。其次,在不同偏压幅值下采用脉冲偏压电弧离子镀技术在石英玻璃及(111)单晶硅基片上制备了均匀透明Cr-O薄膜。研究了偏压幅值(0～0500 V)对薄膜表面形貌、结构、硬度及光学性能的影响。研究结果表明：制得薄膜均具有良好的表面质量,且随偏压幅值的增大薄膜表面质量有明显提高；当施加偏压时薄膜中出现晶化相,且随着偏压幅值的增加,其相结构由Cr203相向CrO相转变；薄膜硬度先增大后减小,负偏压为-300 V时,硬度达到最大值24.4 GPa；制得薄膜表现出良好的光学性能,最高可达72%,随偏压幅值增大薄膜吸收边先红移后蓝移,当负偏压为-200 V时薄膜光学带隙达到最大值1.88 eV。
[Abstract]:Because of its high hardness, high temperature stability, high chemical stability and corrosion resistance, chromium oxide is widely used in metallurgy, pigments, abrasives, refractories and newly developed meltblown coatings. In recent years, the study of chromium oxide thin films is mainly focused on the composition, mechanical properties, friction and wear properties and the feasibility of selective absorption of solar energy. In this paper, chromium oxide thin films were prepared on quartz glass and silicon substrates by pulsed bias arc ion plating. The composition, structure, mechanical properties and optical properties of the films were studied. In order to obtain chromium oxide thin film with good mechanical and optical properties, the aim is to enrich the ceramic thin film material library which can be used for surface modification while developing the technology of ion plating. Firstly, a series of Cr-O thin films were prepared on quartz glass and (111) silicon substrates by pulsed bias arc ion plating under the condition of only changing oxygen flow rate. The effects of oxygen flow rate (40 sccm-200 sccm) on the surface morphology, structure, hardness and optical properties of the films were investigated. The results show that a series of Cr-O thin films have been successfully prepared by pulse bias technique. The films show good surface quality and the contents of various elements in the films are relatively stable. The hardness of the films is above 19.0 GPa, and the maximum value is 24.8 GPA at the oxygen flow rate of 160 sccm, the film exhibits a good transmittance when the oxygen flow rate is 80 sccm, and the maximum optical band gap reaches the maximum value of 1.81 eV.. Secondly, uniform transparent Cr-O thin films were prepared on quartz glass and (111) silicon substrates by pulsed bias arc ion plating at different bias voltages. The effects of bias amplitude (0500 V) on the surface morphology, structure, hardness and optical properties of the films were investigated. The results show that all the films have good surface quality, and the surface quality of the films increases obviously with the increase of the bias amplitude, and the crystalline phase appears in the films when the bias voltage is applied, and increases with the increase of the bias voltage amplitude. The phase structure of the film changes from Cr203 phase to CrO phase, and the hardness of the film increases first and then decreases. When the negative bias voltage is -300V, the hardness reaches the maximum value of 24.4 GPa; and the film exhibits good optical properties. The maximum value is 72. With the increase of bias amplitude, the absorption edge shifts first and then the blue shift. When the negative bias voltage is -200V, the optical band gap of the film reaches the maximum value of 1.88 eV..
【学位授予单位】：大连理工大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB306

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