特种应用光学增透膜与滤光片的制备工艺研究

发布时间：2018-10-08 12:03

【摘要】：薄膜的制备工艺技术是通过各种工艺条件的控制,如真空、膜厚监控和温度控制等来使蒸发膜料在基片沉积形成薄膜状态。每一个工艺因素都可能对最终薄膜的性质产生重大影响。现在制备技术已经经过长期发展,种类很多,最常用的一种就是真空热蒸发方法。宽带增透膜在光学器件生产中有着重要作用。为满足望远镜等光学系统中光学元件可见光范围宽光谱增透的使用要求,根据Tfcalc软件优化设计膜系,使用离子辅助沉积,晶振膜厚控制仪,电子束热蒸发镀膜方法,通过对镀膜工艺参数的不断改进和调整,制备400-700nm的宽带增透膜。结果表明:所制作的可见光增透膜在400-700nm之间平均反射率达到0.36%,优于望远镜等光学系统的增透要求,确定一套优化的镀膜工艺。滤光片在美容、数码和军事等方面应用广泛,针对美容机常用的长波通滤光片,设计出640nm中心波长的膜系。使用真空镀膜机通过电子束蒸发的方法对膜系进行镀制。合理的设计实验流程,并对所镀膜层进行性能分析。实验对滤光片影响因素进行了分析,最终获得中心波长636nm左右,通带和截止带都优于产品标准的长波通滤光片。采用电子束热蒸发和无端离子源的设计工艺镀制的滤光片温漂和透过率变化相比其它工艺组合要小的多,光谱稳定,并拥有较好的低应力控制能力。
[Abstract]:The preparation technology of the film is to make the evaporative film deposited on the substrate to form the film state through the control of various technological conditions such as vacuum film thickness monitoring and temperature control. Each process factor may have a significant impact on the properties of the final film. Now the preparation technology has been developed for a long time, there are many kinds, one of the most commonly used is vacuum thermal evaporation method. Broadband antireflection film plays an important role in the production of optical devices. In order to meet the requirements of wide spectrum antireflection of optical elements in optical systems such as telescopes, according to the Tfcalc software, the film system is optimized, ion assisted deposition, crystal oscillator film thickness control instrument, electron beam thermal evaporation coating method are used. The wide band antireflection film of 400-700nm was prepared by improving and adjusting the process parameters. The results show that the average reflectivity of the antireflection film between 400-700nm is 0.36, which is better than the antireflection requirement of optical system such as telescope, and a set of optimized coating process is determined. The filter is widely used in beauty, digital and military applications. The 640nm central wavelength film system is designed for the long wave pass filter commonly used in the beauty machine. The vacuum coating machine was used to prepare the film system by electron beam evaporation. The experiment flow is designed reasonably, and the performance of the coating is analyzed. The influence factors of filter were analyzed and the central wavelength 636nm was obtained. The pass band and cutoff band were superior to the standard long wave pass filter. The temperature drift and the change of transmittance of the filter prepared by electron beam thermal evaporation and endless ion source plating are much smaller, the spectrum is stable, and the control ability of low stress is better than that of other processes.
【学位授予单位】：青岛大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2

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