当前位置:主页 > 科技论文 > 材料论文 >

氟化非晶碳基薄膜摩擦学行为对配副材料的依赖性

发布时间:2018-10-16 19:08
【摘要】:为了系统研究氟掺杂对非晶碳基薄膜摩擦学行为的影响,以C_2H_2和CF_4为气源,通过等离子体增强化学气相沉积方法制备不同F含量的非晶碳基薄膜.采用XPS、SEM、Raman光谱以及纳米压痕等技术测定薄膜的微观结构、化学组成和力学性能,利用球-盘式往复摩擦试验机评价薄膜与不同配副材料的摩擦磨损性能.结果显示:较低F含量并未显著影响薄膜与强碳黏着对偶Ti、WC和Si_3N_4的摩擦系数;少量F原子掺杂明显增加了薄膜与弱碳黏着对偶ZrO_2和Al_2O_3的摩擦系数;薄膜与GCr15对偶的摩擦系数随F含量增加而明显升高;高F含量导致薄膜与Cu对偶的摩擦系数产生明显波动,而导致薄膜与Al对偶的摩擦系数显著增加;值得注意的是,高F含量薄膜在不同体系中都表现出高摩擦低磨损的特点.高活性F原子与对偶材料的摩擦化学作用能够合理解释不同体系摩擦学行为.
[Abstract]:The microstructure, chemical composition and mechanical properties of the films were measured by XPS,SEM,Raman spectroscopy and nano-indentation techniques. The friction and wear properties of the films with different matching materials were evaluated by a ball disk reciprocating friction tester. The results show that low F content has no significant effect on the friction coefficients of Ti,WC and Si_3N_4, and a small amount of F atom doping increases the friction coefficient of thin films with weak carbon adhesion to dual ZrO_2 and Al_2O_3. The friction coefficient between the film and GCr15 is obviously increased with the increase of F content, and the friction coefficient between the film and Cu is obviously fluctuated by the high F content, and the friction coefficient between the film and Al is obviously increased. The tribological behavior of different systems can be reasonably explained by the tribochemical interaction between highly active F atoms and dual materials.
【作者单位】: 中国科学院兰州化学物理研究所固体润滑国家重点实验室;中国科学院中科院大学;中国科学院宁波材料技术与工程研究所海洋材料与防护技术重点实验室;
【基金】:国家自然科学基金项目(51305433)资助~~
【分类号】:O613.71;TB383.2

【相似文献】

相关期刊论文 前10条

1 欧阳紫靛;刘芳洋;张治安;赖延清;李R,

本文编号:2275354


资料下载
论文发表

本文链接:https://www.wllwen.com/kejilunwen/cailiaohuaxuelunwen/2275354.html


Copyright(c)文论论文网All Rights Reserved | 网站地图 |

版权申明:资料由用户d03aa***提供,本站仅收录摘要或目录,作者需要删除请E-mail邮箱bigeng88@qq.com