外加偏置电场对薄膜的激光损伤影响研究
发布时间：2018-11-10 23:26
【摘要】：类金刚石薄膜(DLC)是一种以sp3杂化键和sp2杂化键的形式结合生成的亚稳态材料,兼具了金刚石和石墨的优良特性,具有高硬度、高弹性模量,低摩擦因数、耐磨损以及良好的真空摩擦的特性。DLC薄膜在红外区有很高的透过率,应用于光学透镜的保护膜、军用车辆和飞行器的红外窗口保护膜。光学薄膜制造及实际应用方面DLC薄膜突破了大面积、高均匀性、高透射比、抗激光兼容的红外减反射膜制备等关键技术。但DLC薄膜激光损伤阈值(LIDT)却非常低,该特性严重制约了薄膜在红外激光系统中的应用。本论文针对DLC薄膜的特性并根据传统的薄膜抗激光损伤方法,提出了一种新的通过外加偏置电场提高DLC薄膜损伤阈值的方法。设计出抗激光损伤阈值的总体方案,搭建外加偏置电场的薄膜损伤测试装置。采用1-on-1零几率损伤法,对比无外加电场和有外加电场的薄膜损伤阈值,再对外加电场不断增加薄膜损伤阈值的改变。最终对测试结果进行总结分析。实验结果显示：在相同激光能量下,DLC薄膜在加外加偏置电场后,损伤形貌有明显的改善,对比无外加电压和外加100v电压薄膜的LIDT从0.57J/cm2提高0.64J/cm2。在电场不断增加情况下薄膜的损失阈值也不断增加,但当增加到一定程度损伤阈值会趋于平稳电场再增加损伤阈值也不会改变。外加电压增加到700v薄膜的LIDT增加到1.33J/cm2电压增到999v薄膜的LIDT不再发生变化。根据物理特性进行了机理分析,在电场作用下激光在薄膜中产生的光生电子发生了快速漂移,有效的减少了激光辐照区域产生的热能量,减缓了薄膜的石墨化。
[Abstract]:Diamond-like carbon (DLC) film is a kind of metastable material formed by combining sp3 hybrid bond with sp2 hybrid bond. It has excellent properties of both diamond and graphite, and has high hardness, high elastic modulus and low friction coefficient. The DLC film has high transmittance in infrared region and is used in the protective film of optical lens and the infrared window protection film of military vehicles and aircraft. The fabrication and practical application of optical thin films have broken through the key technologies such as large area, high uniformity, high transmittance and anti-laser compatible infrared antireflection films. However, the laser damage threshold (LIDT) of DLC thin film is very low, which seriously restricts the application of the thin film in infrared laser system. In this paper, according to the characteristics of DLC thin films and the traditional laser damage resistance method, a new method to increase the damage threshold of DLC thin films by applying bias electric field is proposed. The overall scheme of laser damage threshold was designed, and the thin film damage test device with bias electric field was built. The 1-on-1 zero-probability damage method is used to compare the damage threshold between the film with and without an applied electric field, and then the damage threshold of the film is increased with the increase of the applied electric field. Finally, the test results are summarized and analyzed. The experimental results show that under the same laser energy, the damage morphology of DLC thin films is obviously improved after the application of bias electric field. Compared with the LIDT without applied voltage and 100v voltage, the LIDT of DLC thin films increases by 0.64J / cm ~ 2 from 0.57J/cm2. When the electric field is increasing, the loss threshold also increases, but when the damage threshold is increased to a certain extent, the damage threshold will tend to steady electric field and then increase the damage threshold will not change. When the applied voltage is increased to 700V, the LIDT increases to the 1.33J/cm2 voltage. The LIDT of 999v thin film does not change. According to the mechanism analysis of the physical properties, the photoelectron produced by laser in the film has a fast drift under the action of electric field, which can effectively reduce the thermal energy generated in the laser irradiation region and slow down the graphitization of the film.
【学位授予单位】：西安工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2
本文编号：2323870
[Abstract]:Diamond-like carbon (DLC) film is a kind of metastable material formed by combining sp3 hybrid bond with sp2 hybrid bond. It has excellent properties of both diamond and graphite, and has high hardness, high elastic modulus and low friction coefficient. The DLC film has high transmittance in infrared region and is used in the protective film of optical lens and the infrared window protection film of military vehicles and aircraft. The fabrication and practical application of optical thin films have broken through the key technologies such as large area, high uniformity, high transmittance and anti-laser compatible infrared antireflection films. However, the laser damage threshold (LIDT) of DLC thin film is very low, which seriously restricts the application of the thin film in infrared laser system. In this paper, according to the characteristics of DLC thin films and the traditional laser damage resistance method, a new method to increase the damage threshold of DLC thin films by applying bias electric field is proposed. The overall scheme of laser damage threshold was designed, and the thin film damage test device with bias electric field was built. The 1-on-1 zero-probability damage method is used to compare the damage threshold between the film with and without an applied electric field, and then the damage threshold of the film is increased with the increase of the applied electric field. Finally, the test results are summarized and analyzed. The experimental results show that under the same laser energy, the damage morphology of DLC thin films is obviously improved after the application of bias electric field. Compared with the LIDT without applied voltage and 100v voltage, the LIDT of DLC thin films increases by 0.64J / cm ~ 2 from 0.57J/cm2. When the electric field is increasing, the loss threshold also increases, but when the damage threshold is increased to a certain extent, the damage threshold will tend to steady electric field and then increase the damage threshold will not change. When the applied voltage is increased to 700V, the LIDT increases to the 1.33J/cm2 voltage. The LIDT of 999v thin film does not change. According to the mechanism analysis of the physical properties, the photoelectron produced by laser in the film has a fast drift under the action of electric field, which can effectively reduce the thermal energy generated in the laser irradiation region and slow down the graphitization of the film.
【学位授予单位】：西安工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TB383.2
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，本文编号：2323870
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