阴极离子镀制备TiN薄膜及其光电性能的研究

发布时间：2018-12-12 01:39

【摘要】：氮化钛(TiN)由于其独特的物理、化学、光、电和机械等性能,近年来已成为材料研究热点。本文采用阴极离子镀膜法在304不锈钢基片上制备均匀致密的TiN薄膜。采用X射线衍射、扫描电子显微镜、透射电子显微镜、扫描探针显微镜、紫外可见分光光度计、红外光谱仪等方法研究了薄膜的物相、结构以及光电特性。结果表明,薄膜主要物相为TiN,在(111)晶面具有取向性,同时薄膜中含有少量的O杂质。薄膜表面较平整,颗粒结合紧密,有部分孔洞和小尺寸突起,表面粗糙度Rq约为21.21 nm,薄膜平均厚度约为0.896μm,在红外波段的反射率可达到80%以上,红外辐射率约为0.19,椭偏结果显示TiN薄膜的消光系数k和折射率n与Ag有相似的光学特性,是一种性能优异的低辐射镀膜材料。
[Abstract]:Titanium nitride (TiN) has become a research hotspot in recent years because of its unique physical, chemical, optical, electrical and mechanical properties. Uniform and dense TiN films were prepared on 304 stainless steel substrates by cathodic ion plating. X-ray diffraction, scanning electron microscope, transmission electron microscope, scanning probe microscope, UV-Vis spectrophotometer and infrared spectrometer were used to study the phase, structure and photoelectric properties of the films. The results show that the main phase of the film is TiN, orientation in the (111) crystal mask, and a small amount of O impurity is found in the film. The surface of the film is flat, the particles are tightly bound, and there are some holes and small protrusions. The average thickness of the Rq is about 0.896 渭 m, and the reflectivity of the film is over 80% in the infrared band, and the average thickness of the thin film is about 0.896 渭 m, and the surface roughness of the film is about 21.21 渭 m. The infrared emissivity is about 0.19. The results of ellipsometry show that the extinction coefficient k and refractive index n of TiN film are similar to those of Ag.
【作者单位】：浙江大学材料科学与工程学院;浙江大学硅材料国家重点实验室;
【基金】：“十三五”国家重点研发计划资助项目(2016YFB0303900)
【分类号】：TB383.2

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