高离化率物理气相沉积涂层的研究进展
发布时间：2018-12-28 06:44
【摘要】：高离化率物理气相沉积是一种新发展起来的脉冲磁控溅射技术(HPPMS),具有溅射靶材原子高度离化与峰值功率超过平均功率等特点。它作为一种新型的离子化物理气相沉积技术,在国内外已经成为一个研究热点,其离子体特性、涂层工艺、高功率脉冲放电等备受国内外学者关注。沉积过程中,离子随着电子碰撞与电荷交换发生电离,并按照双极性扩散理论进行传递。在不同工作气压条件下,离子能量分布表现出不同的特点。在放电过程中使用高的峰值功率脉冲(超出一般沉积技术2~3个数量级)与低脉冲占空比(0.5%~10%)实现高电离(50%),从而表现出了优良的结合力,在控制涂层结构与降低涂层的内部压力等方面有相当大的优势。从HPPMS技术制备涂层的应用现状出发,介绍了高离化率物理气相沉积涂层的特点、优势以及在制备复合涂层和涂层界面优化等方面的研究进展。探讨了高离化率物理气相沉积涂层的未来发展趋势,对涂层的应用效果进行了分析。
[Abstract]:High ionization rate physical vapor deposition (PVD) is a newly developed pulsed magnetron sputtering technique (HPPMS),) with the characteristics of high atomic ionization and peak power exceeding average power. As a new type of ionization physical vapor deposition technology, it has become a research hotspot at home and abroad. In the deposition process, the ions ionize with electron collision and charge exchange and transfer according to the theory of bipolar diffusion. The ion energy distribution shows different characteristics under different working pressure. In the discharge process, high ionization (50%) is achieved by using high peak power pulse (2 ~ 3 orders of magnitude higher than conventional deposition technique) and low pulse duty cycle (0.510%). It has great advantages in controlling the coating structure and reducing the internal pressure of the coating. Based on the application of HPPMS technology in the preparation of coatings, the characteristics and advantages of high ionization rate physical vapor deposition coatings, as well as the research progress in the preparation of composite coatings and the optimization of coating interface are introduced. The future development trend of high ionization rate physical vapor deposition coatings was discussed and the application effect of the coatings was analyzed.
【作者单位】： 重庆交通大学机电与车辆工程学院;
【分类号】：TB306
本文编号：2393615
[Abstract]:High ionization rate physical vapor deposition (PVD) is a newly developed pulsed magnetron sputtering technique (HPPMS),) with the characteristics of high atomic ionization and peak power exceeding average power. As a new type of ionization physical vapor deposition technology, it has become a research hotspot at home and abroad. In the deposition process, the ions ionize with electron collision and charge exchange and transfer according to the theory of bipolar diffusion. The ion energy distribution shows different characteristics under different working pressure. In the discharge process, high ionization (50%) is achieved by using high peak power pulse (2 ~ 3 orders of magnitude higher than conventional deposition technique) and low pulse duty cycle (0.510%). It has great advantages in controlling the coating structure and reducing the internal pressure of the coating. Based on the application of HPPMS technology in the preparation of coatings, the characteristics and advantages of high ionization rate physical vapor deposition coatings, as well as the research progress in the preparation of composite coatings and the optimization of coating interface are introduced. The future development trend of high ionization rate physical vapor deposition coatings was discussed and the application effect of the coatings was analyzed.
【作者单位】： 重庆交通大学机电与车辆工程学院;
【分类号】：TB306
【相似文献】
相关期刊论文 前3条
1 张学华;一种物理气相沉积涂层装置[J];物理;1988年11期
2 王小锋;刘道新;唐长斌;张晓化;李文清;;小能量多冲法对物理气相沉积膜层机械性能的评价[J];机械科学与技术;2008年04期
3 ;[J];;年期
，本文编号：2393615
本文链接：https://www.wllwen.com/kejilunwen/cailiaohuaxuelunwen/2393615.html
